Paper No P19: Aluminum Nanostructured Coatings as Alternatives to Metal Oxide and Transparent Semiconductors

Abstract

Al nanostructured coatings are the promising alternative to a tin‐doped indium oxide film (ITO) as transparent conductive electrodes. In this paper, we describe the fabrication of Al nanostructured coatings by electrochemical anodization of aluminum deposited by magnetron sputtering on a glass substrate. The process of anodization is strictly controlled by the characteristic changes of process parameters, followed by selective chemical etching of aluminum oxide. We proposed the model for Al nanostructured coatings describing the dependences of their optical transmittance and surface resistance on the characteristic dimensions of the network structure.