Abstract:The development and design of clean and efficient water splitting photocatalysts is important for the current situation of energy shortage and environmental pollution. A new type of isomorphic GaSe/InS heterostructure is constructed, and the optoelectronic properties were studied through first-principles calculations. The results show that GaSe/InS vdW heterostructure is a type II semiconductor with a band gap of 2.09 eV. However, through the analysis of the energy band edge position and Gibbs free energy chan… Show more
“…The MoSH monolayer exhibits metallic behavior, while the MoSi 2 N 4 monolayer shows semiconducting characteristic with a band gap of 1.81/2.38 eV, which is comparable with that of the experimental measurement of 1.94 eV, confirming the reliability of our calculations. Generally, it is obvious that the HSE06 method predicts a more accurate band gap of semiconductors. , However, the PBE band gap of the MoSi 2 N 4 monolayer is closer to the experimental band gap than the HSE06 method. Thus, we used the PBE method to calculate all the calculations.…”
Following the successful synthesis of single-layer metallic Janus MoSH and semiconducting MoSi 2 N 4 , we investigate the electronic and interfacial features of metal/semiconductor MoSH/MoSi 2 N 4 van der Waals (vdW) contact. We find that the metal/semiconductor MoSH/MoSi 2 N 4 contact forms p-type Schottky contact (p-ShC type) with small Schottky barrier (SB), suggesting that Janus MoSH can be considered as an efficient metallic contact to MoSi 2 N 4 semiconductor with high charge injection efficiency. The electronic structure and interfacial features of the MoSH/MoSi 2 N 4 vdW heterostructure are tunable under strain and electric fields, which give rise to the SB change and the conversion from p-ShC to n-ShC type and from ShC to Ohmic contact. These findings could provide a new pathway for the design of optoelectronic applications based on metal/semiconductor MoSH/MoSi 2 N 4 vdW heterostructures.
“…The MoSH monolayer exhibits metallic behavior, while the MoSi 2 N 4 monolayer shows semiconducting characteristic with a band gap of 1.81/2.38 eV, which is comparable with that of the experimental measurement of 1.94 eV, confirming the reliability of our calculations. Generally, it is obvious that the HSE06 method predicts a more accurate band gap of semiconductors. , However, the PBE band gap of the MoSi 2 N 4 monolayer is closer to the experimental band gap than the HSE06 method. Thus, we used the PBE method to calculate all the calculations.…”
Following the successful synthesis of single-layer metallic Janus MoSH and semiconducting MoSi 2 N 4 , we investigate the electronic and interfacial features of metal/semiconductor MoSH/MoSi 2 N 4 van der Waals (vdW) contact. We find that the metal/semiconductor MoSH/MoSi 2 N 4 contact forms p-type Schottky contact (p-ShC type) with small Schottky barrier (SB), suggesting that Janus MoSH can be considered as an efficient metallic contact to MoSi 2 N 4 semiconductor with high charge injection efficiency. The electronic structure and interfacial features of the MoSH/MoSi 2 N 4 vdW heterostructure are tunable under strain and electric fields, which give rise to the SB change and the conversion from p-ShC to n-ShC type and from ShC to Ohmic contact. These findings could provide a new pathway for the design of optoelectronic applications based on metal/semiconductor MoSH/MoSi 2 N 4 vdW heterostructures.
“…6(b), by using the formulas w Ga2SeS = E vac À E SC C and IP Ga2SeS = E vac À E SC V , respectively. 70 The carrier mobility is a parameter that is essential for efficiency in electronic, 71-73 photovoltaic 74,75 and photocatalytic [76][77][78] applications. However, most semiconductors have low carrier mobilities, 79 which restrict their feasibility in nano-electronic applications.…”
Section: A Structural Analysis and Electronic Properties Of The Prist...mentioning
confidence: 99%
“…Also, there is a negative correlation between effective mass and carrier mobility, i.e., a small (high) effective mass indicates a high (small) carrier mobility. 76,78 We listed the essential parameters required to find carrier mobility (effective mass (m*) and deformation potential (E 1 )), and in-plane stiffness (C 2D,x ) in Table 3. For monolayer Ga 2 SeS, as expected the hole effective mass is found to be larger than the electron effective mass due to the flat-like VBM (see Fig.…”
Section: A Structural Analysis and Electronic Properties Of The Prist...mentioning
Two-dimensional materials are leading the way in nanodevice applications thanks to their various advantages. Although two-dimensional materials allow opportunities for many applications, they have certain limitations. In the last decade,...
“…Zhu et al found that GaN/Zr 2 CO 2 heterostructure has a promising application in tunable high-performance optoelectronic nanodevices due to its large conduction band offset (CBO) and tunable band gap ( Zhu et al, 2021 ). Zhang et al proved that P-GaSe/InS isomorphous heterostructure has excellent performance as a photocatalytic and water splitting material ( Zhang et al, 2021 ).…”
In this work, we study the electronic structure, the effective mass, and the optical properties of the MoSSe/InS van der Waals heterostructures (vdWHs) by first-principles calculations. The results indicate that the MoSSe/InS vdWH is an indirect band gap semiconductor and has type-Ⅱ band alignment in which the electrons and holes located at the InS and the MoSSe side, respectively. The band edge position, the band gap and the optical absorption of the MoSSe/InS vdWH can be tuned when biaxial strains are applied. In addition, compared with MoSSe and InS monolayers, the optical absorption of the MoSSe/InS vdWH is improved both in the visible and the ultraviolet regions. These findings indicate that the MoSSe/InS vdWHs have potential applications in optoelectronic devices.
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