Ta 3 N 5 is av ery promising photocatalyst for solar water splitting because of its wide spectrum solar energy utilization up to 600 nm and suitable energy band position straddling the water splitting redox reactions.H owever,i ts development has long been impeded by poor compatibility with electrolytes.H erein, we demonstrate as imple sputteringnitridation process to fabricate high-performance Ta 3 N 5 film photoanodes owing to successful synthesis of the vital TaO d precursors.A ne ffective GaN coating strategy is developed to remarkably stabilizeT a 3 N 5 by forming acrystalline nitride-onnitride structure with an improved nitride/electrolyte interface. Astable,high photocurrent density of 8mAcm À2 was obtained with aC oPi/GaN/Ta 3 N 5 photoanode at 1.2 V RHE under simulated sunlight, with O 2 and H 2 generated at aFaraday efficiency of unity over 12 h. Our vapor-phase deposition method can be used to fabricate high-performance (oxy)nitrides for practical photoelectrochemical applications.Supportinginformation and the ORCID identification number(s) for the author(s) of this article can be found under: http://dx.