This work examined a Ru-complex/N−Ta 2 O 5 (N−Ta 2 O 5 : nitrogen-doped Ta 2 O 5 ) hybrid photocatalyst for CO 2 reduction. In this material, electrons are transferred from the N−Ta 2 O 5 to the Ru-complex in response to visible light irradiation, after which CO 2 reduction occurs on the complex. N-doping is believed to produce an upward shift in the conduction band minimum (CBM) of the Ta 2 O 5 , thus allowing more efficient electron transfer, although the associated mechanism has not yet been fully understood. In the present study, the effects of NH 3 adsorption (the most likely surface modification following nitrification) were examined using a combined experimental and theoretical approach. X-ray photoelectron spectroscopy data suggest that NH 3 molecules are adsorbed on the N−Ta 2 O 5 surface, and it is also evident that the photocatalytic activity of the Ru-complex/N−Ta 2 O 5 is decreased by the removal of this adsorbed NH 3 . Calculations show that both the occupied and unoccupied orbital levels of Ta 16 O 40 (NH 3 ) x clusters (x = 4, 8, 12, or 16) are shifted upward as x is increased. Theoretical analyses of Ru-complex/cluster hybrids demonstrate that the gap between the lowest unoccupied molecular orbital of the Ta 16 O 40 moiety and the unoccupied orbitals of the Ru-complex in Rucomplex/Ta 16 O 40 (NH 3 ) 12 is much smaller than that in Ru-complex/Ta 16 O 40 . The highest occupied molecular orbital of [Rucomplex/Ta 16 O 40 ] − is evidently localized on the Ta 16 O 40 moiety, whereas that of [Ru-complex/Ta 16 O 40 (NH 3 ) 12 ] − is spread over both the Ta 16 O 40 and Ru-complex. These results indicate that the NH 3 adsorption associated with N-doping can result in an upward shift of the CBM of Ta 2 O 5 . Additional calculations for Ta 16 O 40−y (NH) y (y = 2, 4, 6, 8, or 10) suggest that the substitution of NH groups for oxygen atoms on the Ta 2 O 5 surface may be responsible for the red shift in the adsorption band edge of the oxide but makes only a minor contribution to the upward shift of the CBM.