Vertical power MOS transistor as a thermoelectric quasi-nanowire device J. Appl. Phys. 120, 244903244903 (2016) . The STO films, deposited by atomic layer deposition, were integrated in Pt/STO/TiN nanocrossbars with a feature size of 100 nm. By analysis of the transient currents, the switching kinetics are investigated between 10 ns and 10 4 s for the SET and 10 ns and 100 s for the RESET. A clear influence of the composition on the degree of nonlinearity of the switching kinetics was observed. Applying an analytical model for the oxygen vacancy migration, we were able to explain the differences in the SET kinetics by composition-dependent changes in the thermal conductivity and by a lower activation energy for the Ti-rich sample. This might be utilized in design rules of future ReRAM devices. Published by AIP Publishing. [http://dx