2008
DOI: 10.1590/s1516-14392008000200019
|View full text |Cite
|
Sign up to set email alerts
|

Oxygen diffusion in Bi2O3-doped ZnO

Abstract: In order to clarify the influence of Bi-doping on oxygen diffusion in ZnO, the bulk and grain boundary oxygen diffusion coefficients were measured in Bi 2 O 3 -doped ZnO polycrystals by means of the gas-solid exchange method using the isotope 18 O as the oxygen tracer. The experiments were performed on ZnO sintered samples containing 0.1, 0.3 and 0.5 mol% Bi 2 O 3 . The diffusion annealings were performed at 942, 1000 and 1092 °C, in an Ar+ 18 O 2 atmosphere under an oxygen partial pressure of 0.2 atm. After t… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

1
1
0

Year Published

2013
2013
2015
2015

Publication Types

Select...
5

Relationship

0
5

Authors

Journals

citations
Cited by 6 publications
(2 citation statements)
references
References 10 publications
(10 reference statements)
1
1
0
Order By: Relevance
“…The observed Zn concentration profiles strongly resemble the profiles reported by Sabioni et al for the diffusion of Zn in polycrystalline ceramics. , A typical concentration profile is shown in Figure . It shows the Zn content in a pellet that reacted for 90 min at 1000 °C, as measured by EPMA.…”
Section: Methodssupporting
confidence: 85%
“…The observed Zn concentration profiles strongly resemble the profiles reported by Sabioni et al for the diffusion of Zn in polycrystalline ceramics. , A typical concentration profile is shown in Figure . It shows the Zn content in a pellet that reacted for 90 min at 1000 °C, as measured by EPMA.…”
Section: Methodssupporting
confidence: 85%
“…In order to explore the effect of the oxygen vacancy concentration on the dynamics, the annealing period was varied between 10 and 20 min, creating different oxygen vacancy (and hence donor) concentrations in the near-surface layers. [73][74][75] The sample was then allowed to cool in the presence of oxygen, before a low temperature anneal (603 K, 20 min), followed by a short high temperature anneal in vacuo (1023-1043 K, 10 min), 76 completing the cleaning process. A nal high temperature ash anneal in vacuo has previously been used to remove residual adsorbed oxygen; 76 here it was found to be necessary to eliminate charging during the pump-probe experiment.…”
Section: Zno Preparationmentioning
confidence: 99%