2018
DOI: 10.1002/anie.201808465
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Oxygen‐Assisted Cathodic Deposition of Zeolitic Imidazolate Frameworks with Controlled Thickness

Abstract: Processing metal-organic frameworks (MOFs) as films with controllable thickness on asubstrate is increasingly crucial for many applications to realizef unction integration and performance optimization. Herein, we report af acile cathodic deposition process that enables the large-area preparation of uniform films of zeolitic imidazolate frameworks (ZIF-8, ZIF-71, and ZIF-67) with highly tunable thickness ranging from approximately 24 nm to hundreds of nanometers. Importantly,t his oxygen-reduction-triggered cat… Show more

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Cited by 43 publications
(60 citation statements)
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“…Thus, the undercut‐induced detachment in anodic dissolution (vide supra) can be circumvented in cathodic ECD 40 . However, the cathodic ECD needs demanding conditions, otherwise the metal plating will take place simultaneously, which results in the impurity of the as‐synthesized MOFs 70,74,75 NO3+H2normalO+2eNO2+2OH…”
Section: Mofsmentioning
confidence: 99%
See 1 more Smart Citation
“…Thus, the undercut‐induced detachment in anodic dissolution (vide supra) can be circumvented in cathodic ECD 40 . However, the cathodic ECD needs demanding conditions, otherwise the metal plating will take place simultaneously, which results in the impurity of the as‐synthesized MOFs 70,74,75 NO3+H2normalO+2eNO2+2OH…”
Section: Mofsmentioning
confidence: 99%
“…To circumvent the metal plating problem over the course of the cathodic ECD, Lu et al proposed an oxygen‐assisted cathodic deposition strategy to synthesize a series of ZIFs (ZIF‐8, ZIF‐71, and ZIF‐67) with the advantages of highly tunable thickness and the non‐plating of metallic deposition (Figure 11A). 74 An air‐saturated precursor solution was prepared by dissolving chloride salts (ZnCl 2 or CoCl 2 ) and imidazole ligands in MeOH, and subsequently were purged with air for 30 min, in which the O 2 concentration was about 2 mmol/L. In the presence of supporting electrolyte TBA PF 6 , ZIF‐8 was successfully prepared on the freshly‐peeled highly oriented pyrolytic graphite (HOPG) cathode under the condition of −0.7 V (vs. Ag/AgCl [3 mol/L KCl]) for 2 h at room temperature.…”
Section: Mofsmentioning
confidence: 99%
“…In order to obtain images that are clearer and easier tointerpret, Han's group used Cs-corrected TEM microscope and attempted to acquire images at appropriate defocuses in subsequent studies [30][31][32][33][34][35][36][37] . They observed different surfacedependent termination modes that co-exist in UiO-66: the main exposed {111} surface is terminated with BDC linkers, whereas the truncated surface, which comprises a number of small {100} and {111} facets, is terminated with Zr clusters at the {100}/{111} kinks (Fig.…”
Section: High-resolution Electron Imaging Of Mofsmentioning
confidence: 99%
“…The challenges include the rapid search for a crystal zone axis to minimize beam irradiation, the precise alignment of the image to fully retrieve the high-resolution information, and the accurate determination of the defocus value to process the image to be more interpretable by correcting the 'contrast inversion' caused by the contrast transfer function (CTF) of the objective lens. Combining the use of a DDEC camera with these methods, they successfully acquired atomicresolution TEM images of various bulk and local structures in different MOFs [30][31][32][33][34][35][36][37] . The technical details of these methods can be found in the original publication 30 and are not included here as they are beyond the scope of this article.…”
mentioning
confidence: 99%
“…[1][2][3] Various MOFs have been synthesized using both anodic dissolution [4][5][6][7][8][9][10] and cathodic deposition approaches. 7,[11][12][13][14][15][16] In particular, Zr(IV)based MOFs have been widely investigated due to their high chemical and thermal stabilities. 17 Ameloot et al reported the electrochemical deposition of UiO-66 films, which are prototypal Zr-MOFs, onto the surfaces of anodes and cathodes.…”
mentioning
confidence: 99%