Oxygen‐Assisted Cathodic Deposition of Zeolitic Imidazolate Frameworks with Controlled Thickness

Abstract

Processing metal–organic frameworks (MOFs) as films with controllable thickness on a substrate is increasingly crucial for many applications to realize function integration and performance optimization. Herein, we report a facile cathodic deposition process that enables the large‐area preparation of uniform films of zeolitic imidazolate frameworks (ZIF‐8, ZIF‐71, and ZIF‐67) with highly tunable thickness ranging from approximately 24 nm to hundreds of nanometers. Importantly, this oxygen‐reduction‐triggered cathodic deposition does not lead to the plating of reduced metals (Zn and Co). It is also operable cost‐effectively in the absence of supporting electrolyte and facilitates the construction of well‐defined sub‐micrometer‐sized heterogeneous structures within ZIF films.