Oxidation Studies of Permalloy Films by Quartz Crystal Microbalance, AES, and XPS

Lee, Wen‐Yaung; Eldridge, J. M.

doi:10.1149/1.2133149

Cited by 27 publications

(12 citation statements)

References 15 publications

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“…4 the sNi/sFe for pure metals and alloys for Ar' energy about 1 keV was somewhat greater than unity, but no more than 1.1. The closest value was reported in Ref 5…”

supporting

confidence: 57%

X‐ray photoelectron study of thin evaporated films of Fe/Ni alloy

Nefedov¹,

Pozdeyev²,

Dorfman³

et al. 1980

Surface & Interface Analysis

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“…4 the sNi/sFe for pure metals and alloys for Ar' energy about 1 keV was somewhat greater than unity, but no more than 1.1. The closest value was reported in Ref 5…”

supporting

confidence: 57%

X‐ray photoelectron study of thin evaporated films of Fe/Ni alloy

Nefedov¹,

Pozdeyev²,

Dorfman³

et al. 1980

Surface & Interface Analysis

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“…Relatively few investigations dealt with the passivity of Ni-Fe alloys (6a, [18][19][20][21][22]. The air oxidation of Permalloy (Ni08Fe0.2) was studied before (20,21).…”

mentioning

confidence: 99%

Passivation of Permalloy Thin Films: II . In Situ Characterization of the Oxide Layer by Photoelectrochemical and Impedance Measurements

Dagan

Shen

Tomkiewicz

1992

J. Electrochem. Soc.

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The formation of protective films, on thin films of Permalloy (Ni0.sFeo.2), and on metallic iron and nickel, by air-annealing and by electrochemical oxidation in borate solution (pH = 8.4), was studied. The electronic types and energy gaps of the oxide films were investigated by an in situ measurement of the photocurrent response. The compositions were deduced from the spectral response and were confirmed by Raman and Auger electron spectroscopy. It is shown that the airformed oxides on Permalloy are iron oxides (n-type Fe20:, and Fe:~O4). The oxide formed anodically on Permalloy is a p-type NiO. This oxide exhibits a nondirect transition, in addition to the direct one at 3.9 eV, which is obtained for crystalline NiO. Such nondirect transition is characteristic of amorphous semiconductors but was not reported before for NiO. The thicknesses of the films were calculated from the capacitance, obtained from impedance measurements. Mott-Schottky plots were applied to the impedance data to evaluate the donor or acceptor density.

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“…A limited number of QCM studies under atmospheric pressure conditions have been reported, e.g., in connection with the adsorption of moisture films (2)(3)(4)(5), atmospheric corrosion in the presence of humid air containing gaseous corrosive components (6)(7), oxidation at elevated temperatures (8), and adsorption of corrosion inhibiting organic molecules on various metal surfaces (9)(10)(11).…”

mentioning

confidence: 99%

Studies of Corrosion Kinetics on Electrical Contact Materials by Means of Quartz Crystal Microbalance and XPS

Zakipour

Leygraf

Portnoff

1986

J. Electrochem. Soc.

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Quartz crystal microbalance combined with x-ray photoelectron spectroscopy has been used to study thin corrosion films of electroplated Ni and electroplated Sn or Au on Ni, with Sn-and Au-thicknesses within the range used for electrical contact materials. Results are presented which show that mass changes can be measured in situ during corrosion at atmospheric pressure conditions. Based on quartz crystal microbalance measurements, the influence of SO~ and NO., on the kinetics of atmospheric corrosion has been investigated. Introduction of sub-ppm concentrations of SO~ or NO., alone results in a minor increase in corrosion rates on Ni-coated surfaces and in no significant increase in corrosion rates on Sn-coated surfaces. Introduction of the same concentration of SO~ and NO.2 simultaneously, however, results in significant increases in corrosion rates on all Ni-, Sn-, as well as Au-coated surfaces.The atmospheric corrosion of materials and components for electrical and electronic applications has for a long time been of wide economical interest. With recent advances in small size component technology, it has become obvious that even minor quantities of adsorbed moisture films or corrosion products can result in significant changes in performance or in premature failure of electronic components.The rapid growth of surface analytical techniques during the last two decades has greatly extended the possibilities of studying minute amounts of corrosion products in electronic equipment. Most surface sensitive techniques available today for studies of the corrosion of electronic materials (e.g., Auger electron spectroscopy, x-ray photoelectron spectroscopy, secondary ion mass spectroscopy, electrical contact resistance, and electrolytic reduction) are based on ex situ analysis. Under operating conditions, however, it is of great practical and fundamental interest to be able to continuously monitor the instant corrosion rate. Hence, it is of vital importance to extend the diversification of surface analytical techniques also to those based on in situ analyses.The quartz crystal microbalance (QCM) method can easily measure mass changes of less than 10 -s g/cm 2 during actual exposure conditions (1). The method is based on a piezoelectric quartz crystal which oscillates at its resonance frequency. Deposition of material on the crystal results in a change in resonance frequency which is dependent on the mass of deposited material. In addition to its high sensitivity and the possibilities of performing in situ analysis, the QCM method offers advantages, such as rapid measurements and the absence of any influence of mechanical shaking or vibrations, over volumetric methods.Despite its obvious advantages, the QCM method has found relatively few applications in the study of surface phenomena related to corrosion kinetics of metals. A limited number of QCM studies under atmospheric pressure conditions have been reported, e.g., in connection with the adsorption of moisture films (2-5), atmospheric corrosion in the presence of humi...

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Oxidation Studies of Permalloy Films by Quartz Crystal Microbalance, AES, and XPS

Abstract: THIN FILM CORROSION KINETICS subject and M. R. Lorenz for reviewing this manuscript. They are also indebted to Dr. D. W. Rice for the use of his environmental chamber and ESCA apparatus.

Cited by 27 publications

References 15 publications

X‐ray photoelectron study of thin evaporated films of Fe/Ni alloy

X‐ray photoelectron study of thin evaporated films of Fe/Ni alloy

Passivation of Permalloy Thin Films: II . In Situ Characterization of the Oxide Layer by Photoelectrochemical and Impedance Measurements

Studies of Corrosion Kinetics on Electrical Contact Materials by Means of Quartz Crystal Microbalance and XPS

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