2007
DOI: 10.1016/j.jeurceramsoc.2006.04.026
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Oxidation protection of C/C–SiC composites by an electrophoretically deposited mullite precursor: Cyclic thermogravimetric analysis

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Cited by 15 publications
(4 citation statements)
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“…[13][14][15][16] In addition, the good match of thermal expansion coefficient and good physical and chemical compatibility between mullite (4.4-5.6 × 10 −6 / • C) and SiC (4.3-5.4 × 10 −6 / • C) are another advantage for the adoption of mullite as outer coating material. 17 However, the traditional technologies, such as chemical vapor deposition, 14,18 slurry dipping 19,20 and pack cementation 1,3 are either high-cost or time-consuming. Hydrothermal electrophoretic deposition has been demonstrated to be a facile method to prepare dense coatings with high efficiency and simple operation.…”
Section: Introductionmentioning
confidence: 99%
“…[13][14][15][16] In addition, the good match of thermal expansion coefficient and good physical and chemical compatibility between mullite (4.4-5.6 × 10 −6 / • C) and SiC (4.3-5.4 × 10 −6 / • C) are another advantage for the adoption of mullite as outer coating material. 17 However, the traditional technologies, such as chemical vapor deposition, 14,18 slurry dipping 19,20 and pack cementation 1,3 are either high-cost or time-consuming. Hydrothermal electrophoretic deposition has been demonstrated to be a facile method to prepare dense coatings with high efficiency and simple operation.…”
Section: Introductionmentioning
confidence: 99%
“…Suitable materials for these outer coatings are silicates of aluminum, yttrium and zirconium. It was already shown in previous works, that mullite exhibits favorable protection up to 1550 °C, but fails at higher temperatures due to existence of eutectics at higher silica content [3]. The yttrium silicate system with its high melting compounds Y 2 SiO 5 and Y 2 Si 2 O 7 is expected to ameliorate oxidation resistance above this limiting temperature.…”
Section: Introductionmentioning
confidence: 86%
“…Electrophoretic deposition (EPD) is an important technique for the deposition of thin films for electronic, 1 biomedical, 2,3 electrochemical, 4 energy storage 5 and photovoltaic applications. 6 This method was used for the fabrication of protective coatings, 7 fuel cells 6 and batteries. 8 Electrophoretic deposition is an important tool in nanotechnology of advanced materials.…”
Section: Introductionmentioning
confidence: 99%