Oxidation Properties of Nickel in the Temperature Range 1073–1500 K

Elrefaie, F. A.; Manolescu, A. V.; Smeltzer, W. W.

doi:10.1149/1.2113606

Cited by 26 publications

(12 citation statements)

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“…Fueki and Wagner (4) observed that the value of n was 8 at~temperatures from 1273 to 1373 K, and decreased to 6 at 1463 K and to 3 at 1673 K. They evaluated the diffusivity as a function of oxygen partial pressure from the tangent of the plot of kp vs. log (Po2), and concluded that the diffusivity was independent of oxygen partial pressure below ~0.1 Pa and increased as the oxygen pressure rose above ~0.1 Pa. The value of n varied from 5.6 at 1273 K to 3.5 at 1673 K. On the other hand, Godlewski et al (5) studied the high temperature oxidation of nickel in the temperature range of 1273 -1633 K, at oxygen partial pressures between 1.7 x l0 s and 1.0 x 10 ,~ Pa. Their value of n decreased from 10 to 4.2, with increasing temperature, and they concluded that the inward diffusion of oxygen through the oxide grain boundaries was significant below 1381 K, and that this increased the value of n. Recently, Elrefaie et al (6) found the value of * Electrochemical Society Active Member. n to be around 6 in the oxidation experiments, at temperatures between 1073 and 1500 K, and at oxygen partial pressures of 10 ~ -10 ' Pa.…”

mentioning

confidence: 99%

High Temperature Oxidation of Nickel at 1373 K in CO ‐ CO 2 ‐ O 2 Atmospheres and Morphology Analysis on Scales

Maruyama¹,

Saito²,

Mochizuka³

et al. 1987

J. Electrochem. Soc.

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High temperature oxidation of nickel has been studied at 1373 K in CO-CO~-O2 atmospheres, at oxygen partial pressures between 6.1 x 10 -'~ and 2.1 x 104 Pa. The oxidation kinetics have been followed by continuous mass gain measurements using a thermobalance at the oxidation temperature and by measurements of the scale thickness in metallographic cross sections, after cooling. The grain growth of NiO during oxidation has been also investigated. A double-layered NiO scale is formed near platinum markers, although only a single scale is observed away from the markers. The outer layer is identical in thickness to the scale formed away from markers, and the growth rate is controlled by the outward diffusion of 9 ' 1/6 nickel ions. The diffusivity of nickel ions is proportional to Po2 at oxygen partial pressures higher than =10 Pa. The oxygen pressure dependence of the diffusivity indicates that the predominant defect is a doubly-charged nickel vacancy. At oxygen partial pressures lower than ~10 Pa, the oxygen pressure dependence becomes smaller, suggesting extrinsic behavior. The formation of the inner layer is explained, assuming the inward oxygen transport along grain boundaries in the outer layer. The size of the oxide grains, away from markers, is almost the same as that of the nickel substrate, but the oxide near the markers is much smaller. Grains near the markers coarsen, and the cube of the grain size is proportional to time, and the rate constant is also proportional to Po2 '/". These results suggest that grain growth proceeds through the pore drag mechanism, and that the rate is determined by the lattice diffusion of nickel ions.

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mentioning

confidence: 99%

High Temperature Oxidation of Nickel at 1373 K in CO ‐ CO 2 ‐ O 2 Atmospheres and Morphology Analysis on Scales

Maruyama¹,

Saito²,

Mochizuka³

et al. 1987

J. Electrochem. Soc.

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“…The surrounding region of smaller (~10 µm) grained material is more typical, in appearance, of oxide films seen in the oxidation literature (Elrefaie et al. , 1985).…”

Section: Discussionmentioning

confidence: 99%

Characterization of textured NiO films for application as buffer layers in high temperature superconducting tapes

Woodcock

Abell

Hall

2002

Journal of Microscopy

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Textured NiO films have been grown, by thermal oxidation, on biaxially textured Ni substrates. The films have been characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and electron backscatter diffraction (EBSD). The XRD results showed two texture components, cube texture (001)[100] and (111) with out of plane orientation only. SEM showed much inhomogeneity of grain size on the sample surface. Analysis by EBSD revealed that coarse grained regions were cube textured and fine grained regions were <111> fibre textured. The ability to correlate textural and microstructural data is crucial to the optimization of textured NiO films for use in coated conductor technology.

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“…The molar volumes of the oxides are V(CrO 1.5 ) = V(BO m ) = 14.59 cm 3 /mol and V(AlO 1.5 ) = V(CO l ) = 12.86 cm 3 /mol, while that of the alloys has been set equal to the value of pure nickel (6.594 cm 3 /mol). The rate constant for the oxidation of pure nickel at 1200°C used by Nesbitt, k c (NiO), is equal to 5.4 Â 10 11 cm 2 /s, 22 but the value used here is that calculated from the data reported by Elrefaie et al, 26 which, after conversion in terms of thickness of metal consumed, becomes equal to k c (NiO) = 1.56 Â 10 )10 cm 2 /s.…”

Section: Single Front Of Internal Oxidationmentioning

confidence: 98%

The Internal Oxidation of Ternary Alloys. VIII: The Transition from the Internal to the External Oxidation of the Two Most-Reactive Components Under High-Oxidant Pressures

Niu

Gesmundo

2006

Oxid Met

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Ternary A-B-C alloys, where A is the most-noble and C the most-reactive component, exposed to oxygen pressures above the stability of the least stable oxide AO (high-oxidant pressures) may present two different types of internal oxidation, i.e. either a coupled internal oxidation of both B and C beneath an external AO scale or a single internal oxidation of C beneath an external scale of the oxide of B. This paper examines the conditions required to avoid the coupled internal oxidation of B plus C beneath external AO scales, considering both the case of formation of a single and a double front of internal oxidation. The analysis, based on an extension to ternary alloys of the criterion defined by Wagner for the transition between the internal and external oxidation of the most-reactive component of binary alloys, shows that the addition of B to binary A-C alloys is very effective in reducing the C content needed for this transition in comparison with binary A-C alloys. This results provides a basis for a possible explanation of the third-element effect. However, the actual possibility of its occurrence depends also on the ability to avoid other oxidation modes, not examined here.

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Oxidation Properties of Nickel in the Temperature Range 1073–1500 K

Cited by 26 publications

References 5 publications

High Temperature Oxidation of Nickel at 1373 K in CO ‐ CO 2 ‐ O 2 Atmospheres and Morphology Analysis on Scales

High Temperature Oxidation of Nickel at 1373 K in CO ‐ CO 2 ‐ O 2 Atmospheres and Morphology Analysis on Scales

Characterization of textured NiO films for application as buffer layers in high temperature superconducting tapes

The Internal Oxidation of Ternary Alloys. VIII: The Transition from the Internal to the External Oxidation of the Two Most-Reactive Components Under High-Oxidant Pressures

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