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2013
DOI: 10.1016/j.apsusc.2013.03.082
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Oxidation of TiAl surface with hyperthermal oxygen molecular beams

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Cited by 5 publications
(5 citation statements)
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“…The surface morphology and EDS analysis of TiAl alloy substrate and CPED coatings under different duty cycles after an intermittent isothermal oxidation test are displayed in Figure 10 . The porous and loose surface of TiAl alloy after an oxidation test was composed of elements Ti, Al, and O, which meant that the oxidation products of TiAl alloy were made of compounds of primarily TiO 2 and a little Al 2 O 3 , these results agreed well with previous literature [ 1 , 2 , 3 , 4 ]. With duty cycle increasing, the surface of CPED coatings after an oxidation test became denser and more uniform.…”
Section: Resultssupporting
confidence: 90%
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“…The surface morphology and EDS analysis of TiAl alloy substrate and CPED coatings under different duty cycles after an intermittent isothermal oxidation test are displayed in Figure 10 . The porous and loose surface of TiAl alloy after an oxidation test was composed of elements Ti, Al, and O, which meant that the oxidation products of TiAl alloy were made of compounds of primarily TiO 2 and a little Al 2 O 3 , these results agreed well with previous literature [ 1 , 2 , 3 , 4 ]. With duty cycle increasing, the surface of CPED coatings after an oxidation test became denser and more uniform.…”
Section: Resultssupporting
confidence: 90%
“…Each discharge cycle was composed of discharge and outage, due to the special mechanism of the CPED process. Taking Al 2 O 3 coatings as an example, during the CPED process, Al(OH) 3 gel particles were adsorbed on the surface of the cathode, sintered, and dehydrated in the period of discharge and then congealed in the period of outage, as to form Al 2 O 3 ceramic coatings [ 3 , 4 , 5 , 6 ]. Al 3+ + 3OH − → Al(OH) 3 2Al(OH) 3 → Al 2 O 3 + 3H 2 O …”
Section: Resultsmentioning
confidence: 99%
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“…The incidence direction is surface normal and the surface temperature is 300 K. The schematic view of Cu segregation on the surface during the oxidation is shown in the inset. 6 Secondary-electron image (a) and the elemental mapping (b, c, d) of the oxide TiAl taken after 9.2×10 19 molecules cm -2 2.2-eV-HOMB dose at 923 K 16) . Measurements were performed with a step of 1 mm at the electron energy of 10 kV.…”
mentioning
confidence: 99%
“…The detected X-rays were K a for Al, Ti and O. Reprinted from Ref. 16 with permission from Elsevier.…”
mentioning
confidence: 99%