1986
DOI: 10.1007/bf00053845
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Oxidation of sulphur compounds in the atmosphere: I. Rate constants of OH radical reactions with sulphur dioxide, hydrogen sulphide, aliphatic thiols and thiophenol

Abstract: The reactions of OH radicals with SO2, H 2 S, thiophenol, and a series of aliphatic thiols (1-5 C-atoms) have been investigated in 201 and 381 reaction chambers at 1 atm total pressure and 300 K using a competitive kinetic technique. Initially, OH radicals were produced by photolysis of CH3ONO/NO mixtures in air. Applying this OH source rate constants for OH with SO2, H2S , and thiophenol in synthetic air were determined to be (1.1-+0.2) x l0 -12, (5.5-+0.8) ×10 -12 and (1.1 +-0.2) × 10 -it cm 3 s -1 , resp… Show more

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Cited by 57 publications
(60 citation statements)
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“…The loss rate of CH3SH in chambers has also been measured relative to that for a standard compound such as C2H4 or C3H6 whose reactivity with OH is well understood [24,30]. These values of k 4 are listed in Table IV. All the flash photolysis studies (four studies of which three are from Georgia Tech [25,58,59]) agree that the 298 K value for the rate coeffi- …”
Section: Oh + Ch?sh Ch~3s + Hzo; Kqmentioning
confidence: 99%
“…The loss rate of CH3SH in chambers has also been measured relative to that for a standard compound such as C2H4 or C3H6 whose reactivity with OH is well understood [24,30]. These values of k 4 are listed in Table IV. All the flash photolysis studies (four studies of which three are from Georgia Tech [25,58,59]) agree that the 298 K value for the rate coeffi- …”
Section: Oh + Ch?sh Ch~3s + Hzo; Kqmentioning
confidence: 99%
“…Ethyl mercaptan is highly reactive with OH radicals as a photolysis product in ambient air, and has a half-life time of 0.23 days (Barnes et al, 1986). The major contributor to the loss of ethyl mercaptan is likely its photolysis-related degradation.…”
Section: Zhu Et Al / Journal Of the Air And Waste Management Associatimentioning
confidence: 99%
“…The value measured in this study with 4.09×10 -4 mol m -3 NO presence agrees with the upper values previously reported. The upper values measured by the two relative methods in the literature might also be due to a large amount of NO x presence in the systems because of HONO and CH 3 ONO, respectively, used as OH precursors [8,14].…”
Section: Resultsmentioning
confidence: 99%
“…The rate constant for reaction (1) has been extensively studied, especially [5][6][7][8][9][10][11][12][13][14][15]. It is problematic to arbitrate which value is more accurate to be used for evaluating the influences of H 2 S. Lin et al [13] pointed out that HS formed in reaction (1) *Corresponding author (email: yjmu@rcees.ac.cn) and HSO formed via other secondary reaction in their system could make a significant contribution to the OH removal.…”
mentioning
confidence: 99%