1961
DOI: 10.1149/1.2427963
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Oxidation of Molten High-purity Aluminum in Dry Oxygen

Abstract: unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 142.103.160.110 Downloaded on 2015-06-24 to IP ) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 142.103.160.110 Downloaded on 2015-06-24 to IP ) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 142.103.160.110 Downloaded on 2015-06-24 t… Show more

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Cited by 51 publications
(18 citation statements)
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“…Oxygen consumption rates reported in the literature are shown in Table I. [8][9][10] These were measured in an environment with an unlimited supply of oxygen, i.e., a constant fraction of oxygen equal to 0.2. The measurement of the initial oxygen consumption rate (when f O = 0.2) in the experiment was not possible due to the small delay in operating the equipment, [3] but extrapolation of Eq.…”
Section: B Boundary Conditionsmentioning
confidence: 99%
“…Oxygen consumption rates reported in the literature are shown in Table I. [8][9][10] These were measured in an environment with an unlimited supply of oxygen, i.e., a constant fraction of oxygen equal to 0.2. The measurement of the initial oxygen consumption rate (when f O = 0.2) in the experiment was not possible due to the small delay in operating the equipment, [3] but extrapolation of Eq.…”
Section: B Boundary Conditionsmentioning
confidence: 99%
“…12 The data points in Fig. 2 are the values published by Sleppy 22 for molten aluminum; the molten condition of the substrate practically eliminates the influence on the kinetics from epitaxial and other structural effects at the metal-oxide interface. 12 A single value (2.75 eV) for the metal-oxide work function x 0 was deduced from the illustrated fit to the curves; this value is in reasonable agreement with published values 23 ranging from 1.5 to 2.5 eV.…”
mentioning
confidence: 99%
“…Under equilibrium conditions, [O 2Ϫ ] is a function of oxygen pressure (P) and the thickness of the oxide layer (X). With a very short time of adsorption and relatively low oxygen pressure that are characteristics during RAD process, the following equation can be obtained: [50][51][52][53] [A3]…”
Section: Growth Rate Of the Very Thin Oxidesmentioning
confidence: 99%