2007
DOI: 10.1016/j.jhazmat.2007.01.004
|View full text |Cite
|
Sign up to set email alerts
|

Oxidation of methyl methacrylate from semiconductor wastewater by O3 and O3/UV processes

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
13
0

Year Published

2009
2009
2023
2023

Publication Types

Select...
4
2
1

Relationship

0
7

Authors

Journals

citations
Cited by 28 publications
(13 citation statements)
references
References 14 publications
0
13
0
Order By: Relevance
“…In a study on the oxidation of MMA by O 3 and O 3 /UV processes, a decomposition pathway of MMA was reported by Shang et al (2007). The intermediates of methyl formate, formaldehyde, acetic acid and formic acid were formed before being further oxidized into CO 2 and H 2 O.…”
Section: The Ph Changes During Wao and Cwao Operationsmentioning
confidence: 99%
See 3 more Smart Citations
“…In a study on the oxidation of MMA by O 3 and O 3 /UV processes, a decomposition pathway of MMA was reported by Shang et al (2007). The intermediates of methyl formate, formaldehyde, acetic acid and formic acid were formed before being further oxidized into CO 2 and H 2 O.…”
Section: The Ph Changes During Wao and Cwao Operationsmentioning
confidence: 99%
“…Thus, it exhibits the aquatic toxicity. Other health effects of MMA reported include (1) rapid absorption in the oral or inhalatory uptake of human beings and (2) potential for induction of mutagenic effects, particularly clastogenicity (USEPA, 1998;Shang et al, 2007). Hence, the MMA-containing wastewater needs to be treated adequately because of environmental and health concerns.…”
mentioning
confidence: 99%
See 2 more Smart Citations
“…A large amount of H 2 O 2 will decrease the effectiveness of NDMA removal in the UV/H 2 O 2 system, and residual H 2 O 2 becomes a problem. By comparison, the combination of ozonation with UV irradiation is considered a more effective process for removing organics [28][29][30]. Hydroxyl radicals ( • OH) that are generated in the UV/O 3 process are non-selective and vigorous oxidants.…”
Section: Introductionmentioning
confidence: 99%