Overview of several applications of chemical downstream etching (CDE) for IC manufacturing: advantages and drawbacks versus WET processes

Buttet, C. de; Prevost., E; Campo, Alain; Garnier, Philippe; Zoll, S.; Vallier, L.; Cunge, G.; Maury, P.; Massin, Thomas; Chhun, S.

doi:10.1117/12.2257971

SPIE Proceedings

2017

DOI: 10.1117/12.2257971

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Overview of several applications of chemical downstream etching (CDE) for IC manufacturing: advantages and drawbacks versus WET processes

C. de Buttet

E Prevost.

Alain Campo

et al.

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Overview of several applications of chemical downstream etching (CDE) for IC manufacturing: advantages and drawbacks versus WET processes

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