Overlay control improvements through dynamic sampling
Onur N. Demirer,
Robin M. Zech,
Chao-Jen Tsou
et al.
Abstract:Overlay control continues to be a critical aspect of successful semiconductor lithography processing, with overlay control systems becoming more and more elaborate to meet the requirements of advanced semiconductor nodes. Sampling optimization is especially important including the number of overlay measurements to perform on each wafer, the number of wafers to measure per lot, and where exactly to measure on each wafer. Conventional sampling optimization methodology is to collect dense data for a short period … Show more
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