In this paper we report electron beam induced current (EBIC) measurements on Schottky diodes on undoped GaN samples grown by the metal organic vapor phase epitaxy method on porous silicon substrates. A 2D simulation model was applied to perform the theoretical EBIC profiles and to compare with the experimental one. A minority carrier diffusion length (L) for holes of 0.72 µm was measured in the space charge region, indicating constant diffusivity of 6.48 cm 2 /s and a lifetime coefficient of 0.8 ns. An increase of L is observed as the probe source is moved from the Schottky junction to the bulk material. This increase was related to the polarization effects that are preponderant in group III-nitride devices. Far from the depletion layer (greater than 0.91 µm) the measured current is produced by the reabsorbed recombination radiation process. This corresponds to an optical self-absorption coefficient of a p = 0.112 µm . The results show that the transport parameters depend on the growth technology.