Experiments and the development of apparatus relating to the removal of oxide film and the attempts to prepare an oxide-free surface on uranium are described. Polishing the metal in vacua of the order of 10 -7 tort appears to be the most successful method. UI4~ and UO~ were observed to form rapidly on the metal in such vacua. PuO~ was found to form on plutonium in vacua at pressures of less than 1 x 10 -~ tort. The possibility that plutonium hydride also formed could not be investigated, because of the similarity in crystal structure and lattice parameter between PuO~ and PuH~.The oxide film that commonly occurs on uranium when it is exposed to aqueous or gaseous media has been identified as UO~ in electron diffraction studies by Hickman (1), by Hart (2), and by Flint, Polling, and Charlesby (3). The presence of UO~ in films that are too thin to give rise to interference colors can also be established by standard x-ray technique. Although the detection of thin films by x-ray diffraction is not possible for many metals, it is successful for uranium, because of the high scattering power of the uranium atom.
Hart (2) and Flint et al. (3) list additional lineswhich do not correspond to the diffraction pattern of uranium dioxide. Hart (2) interprets them as due to a mixture of U20~ and U~O~. In our work, no evidence for these lines was obtained. Wilman (4) suggested that the lines observed by Flint et al. should be attributed to diaspore, which had been embedded in the metal surface during polishing. This explanation, however, is not applicable to Hart's work, because he employed diamond dust as an abrasive.In the investigations (1-3) cited above, as well as in a number of the experiments described herein, the metal was polished in air before being admitted to the specimen chamber of the electron diffraction unit. Some of the experiments described below show that it is difficult to eliminate traces of UO~ from the surface. A completely oxide-free surface on uranium (with which to study the formation of the oxide film without the influence of previously existing oxide) was not achieved; our efforts were directed toward improving the ultimate vacuum in which the polishing is conducted, so that the oxide-free portions of the surface would persist long enough to be studied.