Orientation on microdomains of diblock copolymers

Ishizu, Koji; Yamada, Yoshikuni; Fukutomi, Takashi

doi:10.1016/0032-3861(90)90074-9

Cited by 30 publications

(13 citation statements)

References 14 publications

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“…The number of materials studied was not sufficient for determining if there were any intrinsic differences in the conductivities for the com- a Calculated from wt %, assuming all the PPy is in the SPS microphase and FSPS ) 1.06 g/cm 3 and FPPy ) 1.35 g/cm 3 . b The number in parentheses is the standard deviation of five measurements.…”

Section: Resultsmentioning

confidence: 99%

Synthesis of Conductive Nanocomposites by Selective In Situ Polymerization of Pyrrole within the Lamellar Microdomains of a Block Copolymer

1998

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Electrically conductive nanocomposites were prepared by a selective in situ polymerization of pyrrole within the lamellae ionomeric microdomains of sulfonated poly(styrene-b-(ethylene-altpropylene)), SEP, diblock copolymers. A conductivity of 10 -3 -10 -1 S/cm was achieved parallel to the film surface for PPy concentrations from 5 to 11 wt % PPy. Although the microstructure of the block copolymer was not purposefully aligned, the conductivity was anisotropic, varying 1-2 orders of magnitude parallel and normal to the plane of the composite films. The in situ polymerization of pyrrole in the SPS microphase did not disrupt the texture of the block copolymer microstructure, though the interphase between the polystyrene and rubber lamellae became more diffuse. Incorporation of PPy also improved the modulus of the block copolymer above the T g of the ionomer microdomains.

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Section: Resultsmentioning

confidence: 99%

Synthesis of Conductive Nanocomposites by Selective In Situ Polymerization of Pyrrole within the Lamellar Microdomains of a Block Copolymer

1998

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“…Pure PS-bPI block copolymer organizes in bulk in such a way that a layer of PI is adjacent to a free surface PI [6,7]. One would expect a similar result, namely a PI layer adjacent to the free surface, in the situation considered here where a PS-sheet was annealed when covered with a PS-b-PI film.…”

Section: The Polystyrene-polyisoprene Systemmentioning

confidence: 55%

Mechanical Effects of Diblock Copolymer at Interfaces

Brown

Reichert

1992

Journal of Macromolecular Science, Part A

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The effects of a thin layer of diblock copolymer on the adhesion between a glassy polymer and two different materials, an elastomer and a silicon wafer, have been examined. The glassy polymer was polystyrene and the elastomer was polyisoprene. A polystyrene-b-polyisoprene copolymer was employed at the polyisoprene-polystyrene interface whilst a polystyrene-bpolymethylmethacrylate copolymer was used at the polystyrene-silicon interface. The toughness of the glassy-rubbery interface depended on the length of time at room temperature the polyisoprene of the copolymer diffused into the crosslinked polyisoprene homopolymer, when the two were not crosslinked together, but reached a maximum toughness enhancement of a factor of 4. The diffusion process was very slow because the block polyisoprene was tethered to the polystyrene and the polyisoprene homopolymer was crosslinked. Much greater joint toughnesses were found when the block and homopolymer polyisoprene were crosslinked together. The toughness of an interface between polystyrene and a silicon wafer (SiOz) was increased from about 1 J/m2 with no diblock present to about 40 J/m2 with an organized diblock layer at the interface.

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“…17,18) In symmetric diblock copolymer molecules, both blocks are present in equal volume fractions and form alternating lamellar structures with interfaces parallel to the surface of the substrate. [21][22][23] As the thickness of the film can be reduced to less than half the lamellar period by decreasing the concentration of the diblock copolymer solution, the film itself creates the nanostructures on the substrate. 24,25) Benzene, chloroform, 1,4-dioxane, and tetrahydrofuran (THF) are good solvents for both blocks.…”

Section: Good Solvents For Both Ps and P2vp Blocksmentioning

confidence: 99%

Effects of Solvent and Ambient Humidity on Nanodot Structures for Near-Field Optical Data Storage Using Self-Assembled Diblock Copolymer

Matsuyama¹,

Kawata

2005

Jpn. J. Appl. Phys.

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We present the formation of nanodot structures on a glass substrate by the self-assembly of a diblock copolymer. The structures can be used as nanopatterned media for near-field optical data storage with high data density. Improvements in the carrier-to-noise ratio (CNR) and in the uniformity of the recorded bit marks are expected with these structures. It is found that the structure of nanodots depends strongly on the ambient humidity during dripping and subsequent spin-casting and also on the solvent used. Nanodots of uniform size can be formed on a glass substrate with benzene, toluene, or toluene blended with acetone as a solvent when the ambient humidity is in the range of 60% to 70%. The size of the individual nanodots as well as the distance between two consecutive nanodots can be controlled, and the nanodots may be aligned like regular hexagonal close-packed structures by adjusting the volume ratio of acetone to toluene.

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Orientation on microdomains of diblock copolymers

Cited by 30 publications

References 14 publications

Synthesis of Conductive Nanocomposites by Selective In Situ Polymerization of Pyrrole within the Lamellar Microdomains of a Block Copolymer

Synthesis of Conductive Nanocomposites by Selective In Situ Polymerization of Pyrrole within the Lamellar Microdomains of a Block Copolymer

Mechanical Effects of Diblock Copolymer at Interfaces

Effects of Solvent and Ambient Humidity on Nanodot Structures for Near-Field Optical Data Storage Using Self-Assembled Diblock Copolymer

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