Organic Light‐Emitting Nanofibers by Solvent‐Resistant Nanofluidics

Marco, Carmela De; Mele, Elisa; Camposeo, Andrea; Cingolani, R.; Pisignano, Dario

doi:10.1002/adma.200703033

Cited by 33 publications

(40 citation statements)

References 36 publications

(9 reference statements)

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“…Here we demonstrate the power of PBW through high quality Ni mold fabrication and PDMS casting. The PBW fabricated Ni molds can in future also be used employing other NIL techniques or alternative polymer materials for replication following the process described by Rolland et al 2004 andDe Marco et al 2008.…”

Section: Ni Molds For Pdms Fabrication Of Nm Detailsmentioning

confidence: 99%

“…Several groups have been using PDMS and other polymers to fabricate micro and nanofluidic channels (Lei Zhang et al 2008;Xianqiao Hu et al 2011), often nanometer dimensions are obtained but accurate shape control at the sub micron level is not easy to achieve. Other groups have used alternative materials to replicate nanofluidic channels (Rolland et al 2004;De Marco et al 2008).…”

Section: Introductionmentioning

confidence: 99%

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Proton beam writing a platform technology for high quality three-dimensional metal mold fabrication for nanofluidic applications

Kan¹,

Shao²,

Wang³

et al. 2011

Microsyst Technol

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Direct write nanolithographic techniques are powerful techniques to fabricate masters for nano-imprint lithography (NIL). Proton beam writing (PBW) is a relatively new technique which has shown great potential in fabricating three-dimensional (3D) nanostructures in polymer resist material down to the 20 nm level. MeV protons generate secondary electrons and like in many lithographic processes these electrons modify the molecular structure of the resist. The energies of the proton induced secondary electrons are relatively low compared with secondary electrons generated using electron beam writing, therefore proton induced secondary electrons only modify resist material within several nano meters of the proton track. Since protons mainly interact with the substrate electrons the path of the proton beam is very straight, resulting in smooth and well defined resist structures with practically no proximity effects. Further development of current proton beam technology, required to approach sub 10 nm structuring with MeV protons is discussed. To explore the full micro-and nano-fabricating capabilities of PBW it is important to investigate potential new resist materials. In PBW mass production can be achieved through the fabrication of reliable molds and stamps. The compatibility of MeV proton beams for resist materials and post processing steps like electroplating and resist removal are evaluated. The second focus of this paper is PDMS nanofluidic lab on a chip sorting devices using high quality Ni molds. These molds have been prepared via PBW and Ni electroplating, a release layer on a Ni mold allows fine feature replication down to the 300 nm level with high aspect ratios in PDMS.

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Section: Ni Molds For Pdms Fabrication Of Nm Detailsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Proton beam writing a platform technology for high quality three-dimensional metal mold fabrication for nanofluidic applications

Kan¹,

Shao²,

Wang³

et al. 2011

Microsyst Technol

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show abstract

“…In addition to deposition location, alignment of polymer fibers and organic nanowires is desirable on many fronts and essential for equipment that utilizes and/or manipulates electromagnetic energy. Alignment of organic micro-or nano-fibers is beneficial for enhanced charge transport [231,232,263,264], production of polarized light emission [265,266], improved absorption and photovoltaic properties [123,267], and enhanced crystal properties [268]. Additional benefits of parallel fiber arrangement include directional cell growth [269] and guided cell differentiation [270] as well as the achievement of high-modulus, highstrength fibers, which can be used for heat-resistant and protective clothing [271,272].…”

Section: Es Fabrication Of Organic Micro-and Nano-fiber Devicesmentioning

confidence: 99%

“…One-dimensional micro-and nano-fiber devices have been prepared using ES [211][212][213][214][215][216][217][218][219], hard and soft template-assisted methods [220][221][222], self-assembly [223][224][225], scanning probe lithography (direct writing) [226][227][228], direct drawing [229,230], nanoimprint lithography [131], nanofluidics [231], and physical vapor transport and deposition [232]. Review articles of these methods have been published by Kim et al [36] and Long et al [233].…”

Section: Fabrication Of Organic Micro-and Nanofiber Semiconductor Symentioning

confidence: 99%

Electrospinning for nano- to mesoscale photonic structures

et al. 2016

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Abstract:The fabrication of photonic and electronic structures and devices has directed the manufacturing industry for the last 50 years. Currently, the majority of small-scale photonic devices are created by traditional microfabrication techniques that create features by processes such as lithography and electron or ion beam direct writing. Microfabrication techniques are often expensive and slow. In contrast, the use of electrospinning (ES) in the fabrication of microand nano-scale devices for the manipulation of photons and electrons provides a relatively simple and economic viable alternative. ES involves the delivery of a polymer solution to a capillary held at a high voltage relative to the fiber deposition surface. Electrostatic force developed between the collection plate and the polymer promotes fiber deposition onto the collection plate. Issues with ES fabrication exist primarily due to an instability region that exists between the capillary and collection plate and is characterized by chaotic motion of the depositing polymer fiber. Material limitations to ES also exist; not all polymers of interest are amenable to the ES process due to process dependencies on molecular weight and chain entanglement or incompatibility with other polymers and overall process compatibility. Passive and active electronic and photonic fibers fabricated through the ES have great potential for use in light generation and collection in optical and electronic structures/ devices. ES produces fiber devices that can be combined with inorganic, metallic, biological, or organic materials for novel device design. Synergistic material selection and postprocessing techniques are also utilized for broad-ranging applications of organic nanofibers that span from biological to electronic, photovoltaic, or photonic. As the ability to electrospin optically and/or electronically active materials in a controlled manner continues to improve, the complexity and diversity of devices fabricated from this process can be expected to grow rapidly and provide an alternative to traditional resource-intensive fabrication techniques.

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“…[23][24][25] or alternative materials. 26 Standard soft lithography uses molds (masters) created from silicon wafers patterned with a photoresist to produce disposable elastomeric replicas, 27 most commonly from PDMS, ideally suited for high-throughput applications.…”

mentioning

confidence: 99%

High throughput fabrication of disposable nanofluidic lab-on-chip devices for single molecule studies

et al. 2012

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An easy method is introduced allowing fast polydimethylsiloxane (PDMS) replication of nanofluidic lab-on-chip devices using accurately fabricated molds featuring cross-sections down to 60 nm. A high quality master is obtained through proton beam writing and UV lithography. This master can be used more than 200 times to replicate nanofluidic devices capable of handling single DNA molecules. This method allows to fabricate nanofluidic devices through simple PDMS casting. The extensions of YOYO-1 stained bacteriophage T4 and kÀDNA inside these nanochannels have been investigated using fluorescence microscopy and follow the scaling prediction of a large, locally coiled polymer chain confined in nanochannels.

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Organic Light‐Emitting Nanofibers by Solvent‐Resistant Nanofluidics

Cited by 33 publications

References 36 publications

Proton beam writing a platform technology for high quality three-dimensional metal mold fabrication for nanofluidic applications

Proton beam writing a platform technology for high quality three-dimensional metal mold fabrication for nanofluidic applications

Electrospinning for nano- to mesoscale photonic structures

High throughput fabrication of disposable nanofluidic lab-on-chip devices for single molecule studies

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