Organic and Inorganic Hybrid-Polymer Thin Films by PECVD Method and Characterization of Their Electrical and Optical Properties

Abstract

Organic–inorganic hybrid polymer‐like thin films have been deposited on glass and silicon substrates by plasma‐enhanced chemical vapor deposition (PECVD) method using single molecular precursors of the organic–inorganic hybrid polymers. Methylcyclohexane and tetraethylorthosilicate (TEOS) were utilized as organic and inorganic precursors, and hydrogen and Ar (argon) were used as bubbler and carrier gases, respectively. In order to compare the difference between the optical, electrical, and mechanical properties of the plasma polymerized thin films, we grew the hybrid polymer‐like thin films under the conditions of various radio frequency (RF; using 13.56 MHz) powers in the range of 20–50 W with the annealing temperature of grown thin films in the range 200–500 °C. The as‐grown polymerized thin films were in first analyzed by FT‐IR, C–V, ellipsometry, and nanoindentation. The result of FT‐IR showed that the plasma polymerized thin films have highly cross‐linked density with increasing RF power and annealing temperature. Impedance analyzer was utilized for the measurements of C–V curves. From the electrical property measurements, the lowest dielectric constant was obtained to be 2.22.

Surface Modification of Plasma Polymer Thin Films for DNA Fixation by Atmospheric Pressure Plasma Treatment

“…Meanwhile, it was shown that the hardness of hybrid plasma polymer was weaker than organic plasma polymer in the same RF power. 15,16) Consequently, the plasma polymer with lower hardness would be easily treated by N 2 APP, resulting in the higher amine group density in the hybrid plasma polymer films. AFM images of the -DNA fixation on the plasma polymer surface, which is realized by the tilting method, are shown in Fig.…”

Elastic Modulus and Hardness of Plasma‐Polymerized Organosilicones Evaluated by Nanoindentation Techniques

“…Burkey and Gleason attempted to distinguish among mechanical properties ( E = 2–5 GPa, H = 0.2–0.5 GPa) influenced by the duty cycle (2.5–20%) and annealing (400 °C) for plasma polymer films of 1,3,5‐trimethyl‐1,3,5‐trivinylcyclotrisiloxane in a mixture with deionized water deposited at pulsed plasma. A similar study by Bae et al showed a variation of mechanical properties ( E = 4–9 GPa, H = 0.2–0.6 GPa) under the influence of power (20–50 W) and annealing (200–500 °C) for plasma polymer films deposited from a mixture of methylcyclohexane and tetraethylorthosilicate monomers with argon and hydrogen gases. Lee et al deposited plasma polymer films from a mixture of bis‐trimethylsilymethane with oxygen gas; they found that the elastic modulus and hardness increased with the amount of oxygen in the mixture (15–35%), namely 5–9 and 0.4–0.5 GPa, respectively.…”