Optoelectronic properties of the Metal-dielectric complex thin films for applying high sensitivity IR image sensors

Kim, Yena; Kwon, Soon Woo; Park, Seung Jun; Kim, Woo Kyung; Lee, Han-Young; Yoon, Dae Ho; Yang, Woo Seok

doi:10.6111/jkcgct.2011.21.2.060

Journal of the Korean Crystal Growth and Crystal Technology

2011

DOI: 10.6111/jkcgct.2011.21.2.060

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Optoelectronic properties of the Metal-dielectric complex thin films for applying high sensitivity IR image sensors

Yena Kim¹,

Soon Woo Kwon²,

Seung Jun Park³

et al.

Abstract: High sensitivity IR image sensors require materials characteristics with temperature coefficient of resistance (TCR) and IR range absorption. In this study, the metal-dielectric thermo sensitive films (MDTF) based on (SiO 2

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Optoelectronic properties of the Metal-dielectric complex thin films for applying high sensitivity IR image sensors

Abstract: High sensitivity IR image sensors require materials characteristics with temperature coefficient of resistance (TCR) and IR range absorption. In this study, the metal-dielectric thermo sensitive films (MDTF) based on (SiO 2

Cited by 0 publications

References 12 publications

No citations

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