2023
DOI: 10.1016/j.jpcs.2023.111406
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Optoelectronic memory in 2D MoS2 field effect transistor

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Cited by 22 publications
(16 citation statements)
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“…The field-effect mobility of ∼3 cm 2 V –1 s –1 was extracted from the linear part of the transfer curve on the linear scale, shown in the inset of Figure b, according to the formula μ FE = normald I D normald V GS L W 1 C OX V DS where C ox = 1.15 × 10 –8 F cm –2 is the gate dielectric capacitance. The result is consistent with other works on similar devices , and is typical of several TMDs. ,, Since high biases were applied, the current through the oxide was also monitored to make sure that no gate leakage was affecting the measurements.…”
Section: Resultssupporting
confidence: 89%
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“…The field-effect mobility of ∼3 cm 2 V –1 s –1 was extracted from the linear part of the transfer curve on the linear scale, shown in the inset of Figure b, according to the formula μ FE = normald I D normald V GS L W 1 C OX V DS where C ox = 1.15 × 10 –8 F cm –2 is the gate dielectric capacitance. The result is consistent with other works on similar devices , and is typical of several TMDs. ,, Since high biases were applied, the current through the oxide was also monitored to make sure that no gate leakage was affecting the measurements.…”
Section: Resultssupporting
confidence: 89%
“…The result is consistent with other works on similar devices 18,19 and is typical of several TMDs. 13,33,34 Since high biases were applied, the current through the oxide was also monitored to make sure that no gate leakage was affecting the measurements. To understand the mechanisms that limit the mobility in ReS 2 , we examined the temperature dependence of the electrical properties in the range 180−350 K. This range was also chosen since it is suitable to carry out a transistor analysis based on the Arrhenius model.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
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“…Among two-dimensional (2D) layered materials, transition-metal dichalcogenides (TMDs) have exhibited remarkable optoelectronic properties, garnering significant attention due to their tunable bandgap. , The most widely used and exploited TMD is molybdenum disulfide (MoS 2 ), characterized by a direct bandgap (∼1.85 eV) in monolayer and an indirect bandgap (∼1.2 eV) in multilayer form . These features make it suitable for sensitive photodetectors, optoelectronic memories, and performant field-effect transistors (FETs). Nevertheless, the exploration of TMDs is moving forward to other family members with very interesting properties. Distinctively, unlike materials such as graphene, which exhibit a zero bandgap, rhenium disulfide (ReS 2 ) maintains a direct bandgap (∼1.5 eV) consistently in both bulk and monolayer forms. This remarkable property results from the electronic and vibrational decoupling of the stacked monolayers .…”
Section: Introductionmentioning
confidence: 99%