2002
DOI: 10.1016/s0921-4526(01)01024-9
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Opto-structural, electrical and electrochromic properties of crystalline nickel oxide thin films prepared by spray pyrolysis

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Cited by 109 publications
(63 citation statements)
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“…A noticeable decrease of the film thickness with increasing the substrate temperature is observed after substrate temperature 475 • C. This decrease may be attributed to re-evaporation of film material after deposition or to thermal convection of the sprayed droplet during the deposition process or both. Another cause which may account for thickness decrease is water loss [18] or removal of interlayer water with consequent formation of the compact film. The decrease in film thickness at higher substrate temperatures may be due to a higher evaporation rate of the initial ingredients of the solution.…”
Section: Electrical and Optical Parameters Mappingmentioning
confidence: 99%
“…A noticeable decrease of the film thickness with increasing the substrate temperature is observed after substrate temperature 475 • C. This decrease may be attributed to re-evaporation of film material after deposition or to thermal convection of the sprayed droplet during the deposition process or both. Another cause which may account for thickness decrease is water loss [18] or removal of interlayer water with consequent formation of the compact film. The decrease in film thickness at higher substrate temperatures may be due to a higher evaporation rate of the initial ingredients of the solution.…”
Section: Electrical and Optical Parameters Mappingmentioning
confidence: 99%
“…It is evident that the improvement of the material properties can be reached by the optimization of the preparation conditions. NiO films can be fabricated by different physical and chemical vapour deposition techniques and numerous attempts including sputtering [10,11], plasma-enhanced chemical vapour deposition [12], pulsed laser deposition [13], electrochemical deposition [14,15], sol-gel [16], and spray pyrolysis [17] have been used in the preparation NiO thin films. Among these methods, reactive sputtering is considered to be most widely useful technique having high deposition rates, uniformity over large areas of the substrates and easy control over the composition of the deposited films.…”
Section: Introductionmentioning
confidence: 99%
“…There are several methods to prepare nickel oxide * Corresponding author. films, which include sputtering [3], spray pyrolysis [7], chemical vapor deposition [8], electroless [9] and sol-gel deposition [10]. Among these methods, reactive sputtering is the most widely used one and NiO x films with good electric and optical properties have been obtained [11][12][13][14].…”
Section: Introductionmentioning
confidence: 99%