Optimum inductively coupled plasma etching of fused silica to remove subsurface damage layer

Jiang, Xiaolong; Liu, Ying; Liu, Zhengkun; Qiu, Keqiang; Xu, Xin­guang; Ye, Hong; Fu, Shaojun

doi:10.1016/j.apsusc.2015.07.168

Cited by 15 publications

(6 citation statements)

References 21 publications

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“…While, the substrate is still approachable for the soft inhibitor since it comes from the bulk plasma. More details about the isolation device can be found in our previous work [10]. Table 1 shows the X-ray photoelectron spectroscopy (XPS) results measured on fused silica surfaces of different treatments: un-treated, conventionally etched, conventionally etched + piranha wet cleaning and isolated etched.…”

Section: Origin Of the Bi-stage Evolution Of Nano-roughnessmentioning

confidence: 99%

“…For highdensity plasma etching, the ratio of ions to reactive neutrals is so large that ion etching is dominant. As a high density plasma etching, inductively couple plasma (ICP) etching is nowadays the most popular high plasma etching process [4,[10][11][12]. It combines plasma etching with ion bombardment at relatively low pressure, making the etching highly anisotropic.…”

Section: Introductionmentioning

confidence: 99%

“…However, plasma etching often causes the development of roughness on etched surface [10,[13][14][15][16][17][18][19][20][21]. This influence could be detrimental or beneficial dependent on the application background.…”

Section: Introductionmentioning

confidence: 99%

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Bi-stage time evolution of nano-morphology on inductively coupled plasma etched fused silica surface caused by surface morphological transformation

Jiang

Zhang

Bai

et al. 2017

Applied Surface Science

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In this work, we experimentally investigate the surface nano-roughness during the inductively coupled plasma etching of fused silica, and discover a novel bi-stage time evolution of surface nano-morphology. At the beginning, the rms roughness, correlation length and nano-mound dimensions increase linearly and rapidly with etching time. At the second stage, the roughening process slows down dramatically. The switch of evolution stage synchronizes with the morphological change from dual-scale roughness comprising long wavelength underlying surface and superimposed nano-mounds to one scale of nano-mounds. A theoretical model based on surface morphological change is proposed. The key idea is that at the beginning, etched surface is dual-scale, and both larger deposition rate of etch inhibitors and better plasma etching resistance at the surface peaks than surface valleys contribute to the roughness development. After surface morphology transforming into one-scale, the difference of plasma resistance between surface peaks and valleys vanishes, thus the roughening process slows down.

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Section: Origin Of the Bi-stage Evolution Of Nano-roughnessmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Bi-stage time evolution of nano-morphology on inductively coupled plasma etched fused silica surface caused by surface morphological transformation

Jiang

Zhang

Bai

et al. 2017

Applied Surface Science

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“…Unfortunately, the damage precursors in the subsurface layer such as scratches and embedded impurities are too stubborn to be avoided, even though the surface fabrication level of fused silica optics nearly approach to its limit. Recently, more efforts have been focused on removing the SSD by developing advanced surface modification processes, such as HF-based etching [ 4 , 5 ], ion beam etching (IBE) [ 6 , 7 , 8 ], magnetorheological polishing (MRF) [ 9 ] and reactive ion etching (RIE) [ 10 , 11 ]. Comparing the different attempts at surface modification for fused silica, the last-mentioned RIE technique exhibits some distinct advantages.…”

Section: Introductionmentioning

confidence: 99%

Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process

et al. 2018

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The reactive ion etching (RIE) process of fused silica is often accompanied by surface contamination, which seriously degrades the ultraviolet laser damage performance of the optics. In this study, we find that the contamination behavior on the fused silica surface is very sensitive to the RIE process which can be significantly optimized by changing the plasma generating conditions such as discharge mode, etchant gas and electrode material. Additionally, an optimized RIE process is proposed to thoroughly remove polishing-introduced contamination and efficiently prevent the introduction of other contamination during the etching process. The research demonstrates the feasibility of improving the damage performance of fused silica optics by using the RIE technique.

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“…Plasma treatment, especially argon plasma treatment with high energy to bombard the substrate, provides an effective, environmental friendly and versatile technique for modifying the surface properties and improving the coating performances . Cr ion etching before or during coating fabrication process in Ar atmosphere could smooth out the coating surface and significantly reduced the surface roughness of coating .…”

Section: Introductionmentioning

confidence: 99%

Effects of intermediate Ar plasma treatments on CrN coating microstructures and property evolutions

Guan

Wang

Zhang

et al. 2016

Surf. Interface Anal.

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Chromium nitride (CrN) coatings with different steps of intermediate argon plasma treatments were deposited with primary (200) orientation by multi‐arc ion plating technique. By virtue of scanning electron microscopy, X‐ray diffraction and high‐resolution transmission electron microscopy, the influence of intermediate argon plasma treatments on the coating microstructures, mechanical properties and corrosion properties as well as tribological behaviors in artificial seawater solutions were systematically investigated. It was assumed that the mechanical properties, adhesion strength, corrosion and tribological performances of coatings depended on argon plasma treatment steps. High‐performance coatings could be obtained by proper plasma treatment steps. The superior anti‐corrosion ability of coating with appropriate treatment steps may be ascribed to the increased charge transfer resistance due to alternative interface and CrN layer and the compact microstructure. On the other hand, the excellent tribological performances in seawater conditions may be attributed to the enhanced mechanical properties. Otherwise, further increase in treatment steps was assumed to distinctly increase defects and deteriorate the coating integrity thus weakening coating properties and behaviors. Copyright © 2016 John Wiley & Sons, Ltd.

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Optimum inductively coupled plasma etching of fused silica to remove subsurface damage layer

Cited by 15 publications

References 21 publications

Bi-stage time evolution of nano-morphology on inductively coupled plasma etched fused silica surface caused by surface morphological transformation

Bi-stage time evolution of nano-morphology on inductively coupled plasma etched fused silica surface caused by surface morphological transformation

Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process

Effects of intermediate Ar plasma treatments on CrN coating microstructures and property evolutions

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