Optimizing the strength of an evanescent wave generated from a prism coated with a double‐layer thin‐film stack

Ke, Pu Chun; Gan, Xiaosong; Szajman, Jakub; Schilders, S. P.; Gu, Miṅ

doi:10.1002/1361-6374(199703)5:1<1::aid-bio1>3.3.co;2-s

Cited by 16 publications

(9 citation statements)

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“…Different optimizations are then carried out for 10 −2 <n" p <10 −5 . interfaces that lend dielectric multi-layers even more interests. Kaiser et al [19][20][21] reported an enhancement factor of 1000 using m-line measurements, while Perry et al [22] demonstrated an improvement of the 1 st order of diffraction by a grating-based multi-dielectric stack. Jeun Kee Chua et al [23] numerically optimized a four layers stack to achieve a full transmission.…”

Section: Introductionmentioning

confidence: 99%

Bandwidths limitations of giant optical field enhancements in dielectric multi-layers

Zerrad¹,

Lereu²,

N'Diaye³

et al. 2017

Opt. Express

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Dielectric multilayers, when properly optimized, have been shown to sustain giant optical field enhancement directly linked to the imaginary index of the materials. Such giant optical field is of great interests to increase tremendously the sensitivity of optoelectronic systems. Unfortunately, this ultra-sensitive system is also highly depending on the illumination conditions. We discuss here the effect of the angular divergence and the spectral bandwidth of the incident laser beam on the absorption and field enhancement. In this study, we clearly show that giant optical field enhancements, up to several decades, may be achievable when the incident conditions are down few μrad and pm in term of angular and spectral bandwidths respectively.

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Section: Introductionmentioning

confidence: 99%

Bandwidths limitations of giant optical field enhancements in dielectric multi-layers

Zerrad¹,

Lereu²,

N'Diaye³

et al. 2017

Opt. Express

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“…As a result, the strength of the focused evanescent spot is enhanced significantly. In fact, if the cover slip is coated with a double layer stack [2], the strength could be increased by four orders of magnitude, compared with that on the prism surface. Such scanning near-field microscopy is useful not only in single-molecule detection but also in nano-fabrication and nano-sensing.…”

Section: Discussionmentioning

confidence: 99%

Scanning total internal reflection fluorescence microscopy

Chon

2003

SPIE Proceedings

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We report on a new form of total internal reflection fluorescence microscopy. Instead of using a prism, an objective of numerical aperture 1 .65 is used under ring beam illumination. As a result, the propagating component of the illumination wave is suppressed and a focused evanescent spot is produced with strength of 20 times stronger than that in the prism. A near-field image is obtained by the scanning of a sample illuminated by the evanescent focal spot. The new imaging system has been successfully used for characterising CdSe quantum dot nanoparticles and will be useful in nano-fabrication and single-molecular detection.Key works: Near-field microscopy, evanescent wave, optical and innovative microscopy, thin film and surface characterisation.

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“…Numerous work have been reported on dielectric multilayers optimization using both Bloch surface waves [1][2][3][4][5][6][7][8][9][10][11][12][13] or admittance formalism in the total internal reflection conditions [14][15][16][17][18][19] towards giant field enhancement generation [20][21][22][23][24][25][26][27]. Because of the geometric similarities, the optical response of the optimized dielectric multilayers (DM) is often compared [28][29][30][31] with plasmon excitation [32][33][34][35][36] in metal thin films [37].…”

Section: Introductionmentioning

confidence: 99%

Sensitivity of resonance properties of all-dielectric multilayers driven by statistical fluctuations

Lereu¹,

Lemarchand²,

Zerrad³

et al. 2019

Opt. Express

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In photonics and emerging fields of quantum and topological materials, increasing demands are placed upon the state and control of electromagnetic fields. Dielectric multilayer materials may be designed and optimized to possess extremely sharp spectral and angular photonic resonances allowing for the creation of fields orders of magnitude larger than the exciting field. With enhancements of 10 4 and higher, the extreme nature of these resonances places high constraints on the statistical properties of the physical and optical characteristics of the materials. To what extent the spectral and angular shifts occur as a result of fluctuations in the refractive indices and morphologies of the involved low-loss subdomains have not been considered previously. Here, we present how parameter variations such as those caused by fluctuations in deposition rate, yielding bias, random and compensated errors, may affect the resonance properties of low-loss all-dielectric stacks.

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Optimizing the strength of an evanescent wave generated from a prism coated with a double‐layer thin‐film stack

Cited by 16 publications

References 0 publications

Bandwidths limitations of giant optical field enhancements in dielectric multi-layers

Bandwidths limitations of giant optical field enhancements in dielectric multi-layers

Scanning total internal reflection fluorescence microscopy

Sensitivity of resonance properties of all-dielectric multilayers driven by statistical fluctuations

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