Optimizing the plasma deposition process parameters of antistiction layers using a DOE (design of experiment)

Nam-Goo, Cha; Park, Chang-Hwa; Cho, Min-Soo; Park, Jin-Goo; Jeong, Jun‐Ho; Lee, Eung-Sug

doi:10.3740/mrsk.2005.15.11.705

Korean. J. Mater. Res.

2005

DOI: 10.3740/mrsk.2005.15.11.705

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Optimizing the plasma deposition process parameters of antistiction layers using a DOE (design of experiment)

Cha Nam-Goo¹,

Chang-Hwa Park²,

Min-Soo Cho³

et al.

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Optimizing the plasma deposition process parameters of antistiction layers using a DOE (design of experiment)

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References 13 publications

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