2010
DOI: 10.1016/j.tsf.2009.08.038
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Optimization of thermoelectric properties on Bi2Te3 thin films deposited by thermal co-evaporation

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Cited by 211 publications
(126 citation statements)
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“…It is important to note that the Seebeck coefficients for both n-and p-type doped tellurium are quite large at room temperature, reaching a peak value of 450 μV/K at a hole concentration around 10 17 cm −3 and with an average value in the range of 200-250 μV/K. These values of S for a single-element solid compare favorably with those reported for optimized Bi 2 Te 3 [37]. The large Seebeck coefficient for tellurium is mainly due to the large asymmetry of the transport distribution function from the the staircaselike DOS shown in Fig.…”
Section: Resultssupporting
confidence: 71%
“…It is important to note that the Seebeck coefficients for both n-and p-type doped tellurium are quite large at room temperature, reaching a peak value of 450 μV/K at a hole concentration around 10 17 cm −3 and with an average value in the range of 200-250 μV/K. These values of S for a single-element solid compare favorably with those reported for optimized Bi 2 Te 3 [37]. The large Seebeck coefficient for tellurium is mainly due to the large asymmetry of the transport distribution function from the the staircaselike DOS shown in Fig.…”
Section: Resultssupporting
confidence: 71%
“…9 These power factors are comparable to state of the art thermoelectric material such as pure Bi 2 Te 3 or PbTe. [10][11][12] The value is high considering that it is obtained for a nitride material without any deliberate optimization of doping and has been suggested to be related to electronic structure effects of nitrogen vacancies and oxygen incorporation. 9,13 However, for most practical applications, the thermoelectric figure of merit (ZT) of ScN is too low.…”
Section: à3mentioning
confidence: 99%
“…Thermoelectric p-type (Sb 2 Te 3 ) and n-type (Bi 2 Te 3 ) thin films with thickness of 5 lm with high figures of merit were obtained by a thermal co-evaporation method (Goncalves et al 2006) in a high-vacuum chamber with base pressure p = 3 9 10 -6 mbar. The substrate temperature and evaporation rates were controlled during all the deposition process in order to obtain the desired properties.…”
Section: Fabrication Of the Detectormentioning
confidence: 99%