Optimization of the deposition parameters of Ni-20Cr thin films on thermally sprayed Al2O3 for sensor application

Effects of AlN and BCN Thin Film Multilayer Design on the Reaction Time of Ni/Ni-20Cr Thin Film Thermocouples on Thermally Sprayed Al2O3

“…1.2235 (AISI-L2) steel substrates were selected as substrate material. To ensure an electrical isolation and a thermal insulation between the substrate and the thin film thermocouples, first a NiCrAlY (AMPERIT 413.003, HC Starck, München, Germany) bond coat and subsequently a Al 2 O 3 (Metco 6062, Sulzer Metco, Pfäffikon, Switzerland) coating were deposited on the steel substrate by means of atmospheric plasma spraying (APS) as reported in Reference [16]. Prior the deposition of the thin films, the Al 2 O 3 layer were ground and polished to a roughness of Rz = 1.45 ± 0.27 µm.…”

“…An approach without changing the composition, is to decrease the sensor size of the thin film thermocouples to foster a faster response time and a higher sensitivity [13,15]. In addition, it is possible to influence the physical structure and the morphology of the thin layers by adjusting the PVD deposition parameters, so that the thermoelectric properties are changed [16]. An increased sputtering power as well as a higher substrate temperature become obvious in a decreased Temperature Coefficient of Resistance as well as the electrical resistance of NiCr thin films with 20 at.-% Cr [17], whereby these properties affect, among others, the applicability for thermoelectric applications.…”

“…An increased sputtering power as well as a higher substrate temperature become obvious in a decreased Temperature Coefficient of Resistance as well as the electrical resistance of NiCr thin films with 20 at.-% Cr [17], whereby these properties affect, among others, the applicability for thermoelectric applications. Moreover, due to a higher bias-voltage, a lower electrical resistance can be achieved for Ni-20Cr thin films [16]. Furthermore, it is possible to change the growth behaviour and accordingly, the electrical and physical properties of the thin films by changing the substrate material.…”

Combining Thermal Spraying and Magnetron Sputtering for the Development of Ni/Ni-20Cr Thin Film Thermocouples for Plastic Flat Film Extrusion Processes

“…The AlN and BCN thin films were synthesized on AISI 1045 steel substrates (Ø40 mm), which were prior coated with Al 2 O 3 using atmospheric plasma spraying. Detailed spray parameters of the Al 2 O 3 coating are reported in [21]. The nitride thin films were deposited in medium frequency (MF) mode using one B 4 C (99.50% purity, Sindlhauser Materials GmbH, Kempten, Germany) and two Al (99.50% purity, CemeCon AG, Würselen, Germany) targets operating with 3150 W and 2× 1875 W at a total chamber pressure of 330 mPa.…”

Microstructural characterization and film-forming mechanism of a phosphate chemical conversion ceramic coating prepared on the surface of 2A12 aluminum alloy

“…Surface modication is regarded as the most effective and straightforward approaches to protect Al alloys, 15 which including anodic oxidation 16,17 and micro-arc oxidation, 18,19 thermal spraying, 20,21 electroplating, 22,23 ion implantation, 24,25 electroless plating, 26,27 magnetron sputtering, 28,29 laser processing 30,31 and chemical conversion treatment. 32,33 Thereinto, chemical conversion treatment is considered as an ideal method, which shows advantages such as simple and suitability for the treatment of irregular surfaces.…”