“…Contrast analysis of the microtwins shows that most of them are not 3N-layer twins but contain a stacking fault. EXPERIMENTAL Silicon on Sapphire (SOS) films grown by CVD (Chemical Vapour Deposition) of SiH4 in Hz at temperatures of 1273 K with a deposition rate of 3 p m min-l were investigated by TEM, to characterize the crystal defects present near the interface of the heteroepitaxial (OOl)~i/(T012)~,, (ZZO)si11(01i2)sa system (Cullen, 1971;Druminski, 1976). Ion beam thinning from the sapphire side was used to get transparent foils for a 200 kV electron microscope.…”