Optimization of Optical Channel of Scanning Laser Nanolithographer for Writing on Photo- And Thermo-Sensitive Materials

Abstract

New units and modified constructional components of an optical channel of a scanning X-Y laser nanolithographer are described. The nanolithographer serves for direct laser writing of subwavelength diffractive structures on thin-film photo- and thermo-sensitive materials deposited on planar transparent glass substrates. Significant changes were introduced into a unit of spatial frequency filtration, expansion and collimation of the laser beam of a writing laser. A new unit for on-line in-situ inspection of written diffractive structure is a unit of backward incoherent illumination.