2020
DOI: 10.1109/ted.2020.2968186
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Optimization of Ohmic Contact for AlGaN/GaN HEMT on Low-Resistivity Silicon

Abstract: In this study, we report the optimisation of ohmic contact formation on AlGaN/GaN on low resistivity silicon. To achieve this, a strategy of uneven AlGaN / GaN was introduced through patterned etching of the substrate under the contact. Various pattern designs (holes, horizontal lines, vertical lines, grid) and varied etch depth (above and below the 2-dimensional electron gas) were investigated. Further, a study of planar and non-planar ohmic metallisation was investigated. Compared to a traditional fabricatio… Show more

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Cited by 21 publications
(12 citation statements)
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“…e threephase four-wire bidirectional inverter is completed by the traditional three-bridge arm and the split bus capacitor combined with the neutral bridge arm, in order to deal with the hidden dangers of the system caused by the voltage oscillation when the unbalanced load occurs. Because the DAB primary battery voltage is low, the selected SiC-MOSFET is SCT3022AL packaged with TO-247, and the SCT3030KL packaged with TO-247 is selected on the inverter side [8]. In order to make the system reach 97% efficiency, the design firstly conducts a double-pulse test on two SiC switches, the gate resistance is 2.7Ω and 2Ω, respectively, and the driving circuit is completed with a 4layer PCB.…”
Section: Systemmentioning
confidence: 99%
“…e threephase four-wire bidirectional inverter is completed by the traditional three-bridge arm and the split bus capacitor combined with the neutral bridge arm, in order to deal with the hidden dangers of the system caused by the voltage oscillation when the unbalanced load occurs. Because the DAB primary battery voltage is low, the selected SiC-MOSFET is SCT3022AL packaged with TO-247, and the SCT3030KL packaged with TO-247 is selected on the inverter side [8]. In order to make the system reach 97% efficiency, the design firstly conducts a double-pulse test on two SiC switches, the gate resistance is 2.7Ω and 2Ω, respectively, and the driving circuit is completed with a 4layer PCB.…”
Section: Systemmentioning
confidence: 99%
“…The lower contact resistance could be achieved by optimization of RTA process [10], upgrade of ohmic metal schemes [11], [12], the recess of the barrier layer in the ohmic regions [13], [14], deposition of Ge and/or Si prior to ohmic metal evaporation [15], [16], and heavily doping in the ohmic regions by ion implantation or regrown ohmic contact [17], [18]. Additionally, scaling down the source-drain distance and adoption of strongly polarized high-Al-content heterojunction are meaningful to the reduction of access resistance [19][20][21].…”
Section: Introductionmentioning
confidence: 99%
“…2. GaN HEMT: these devices are based on Si wafers 142,143,162 (GaN-on-Si technology)**** on which their AlGaN/GaN thin layers are placed (Figure 11A). Unlike previous devices, GaN HEMTs are turned on by default (normally-on).…”
Section: Sic Diodesmentioning
confidence: 99%