Optimization of multi-pole aperture for via patterning of 90 nm logic devices by KrF lithography

Fang, Shu Ping; Yang, Hui‐Fang; Chang, Hsien-an; Chiang, Paul; Lin, Benjamin Sue-Min; Hung, Kuei-Chun

doi:10.1117/12.598707

Optical Microlithography XVIII 2005

DOI: 10.1117/12.598707

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Optimization of multi-pole aperture for via patterning of 90 nm logic devices by KrF lithography

Shu Ping Fang

Hui‐Fang Yang

Hsien-an Chang

et al.

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Optimization of multi-pole aperture for via patterning of 90 nm logic devices by KrF lithography

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