2014
DOI: 10.1002/ppap.201300177
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Optimization of Cyclopropylamine Plasma Polymerization toward Enhanced Layer Stability in Contact with Water

Abstract: The present investigation of cyclopropylamine (CPA) plasma polymerization in pulsed and continuous wave radio frequency (RF) discharges leads to the proposition of conditions at which amine-rich films exhibit a good stability in contact with water. The analyses reveal complex structure of CPA plasma polymers containing hydrocarbon chains, primary and secondary amines, nitriles and possibly imines. The decomposition of the monomer in plasma is progressing with the composite parameter W/F (RF power over monomer … Show more

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Cited by 57 publications
(66 citation statements)
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“…The layer prepared at 33 W exhibited compressive stress of 60 ± 30 MPa, while the layer prepared at 250 W exhibited tensile stress of −90 ± 50 MPa. Hence, as showed before, the stresses in the PP‐CPA layers are quite low but vary depending on the energy input.…”
Section: Resultssupporting
confidence: 86%
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“…The layer prepared at 33 W exhibited compressive stress of 60 ± 30 MPa, while the layer prepared at 250 W exhibited tensile stress of −90 ± 50 MPa. Hence, as showed before, the stresses in the PP‐CPA layers are quite low but vary depending on the energy input.…”
Section: Resultssupporting
confidence: 86%
“…Only the layer deposited at the highest average power, 250 W, exhibited a large increase of surface roughness (by a factor of 50) due to de‐wetting of this film (Figure d). Similarly, as reported by Manakhov et al this morphology is supposed to result from a layer buckling caused by de‐wetting of PP‐CPA due to the release of stresses in the layer after the contact with water.…”
Section: Resultsmentioning
confidence: 99%
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“…Functional plasma polymers, mainly comprising oxygen‐ or nitrogen‐containing groups, are of increasing importance for biomedical applications, but also as adhesion‐promoting layers . Therefore, their stability in ambient air and in aqueous environments is crucial for many applications.…”
Section: Introductionmentioning
confidence: 99%