Optimization of a silicon wafer texturing process by modifying the texturing temperature for heterojunction solar cell applications

Abstract

A simple and effective method using a two-step texturing temperature control is proposed to optimize the texturing process of commercial Cz-silicon wafers.

Pyramid‐Textured Antireflective Silicon Surface In Graphene Oxide/Single‐Wall Carbon Nanotube–Silicon Heterojunction Solar Cells

“…However, the size of the pyramids is not homogeneous over the entire surface, as shown in Figure b,c and f. After 25 min, there are more larger pyramids while the largest size seems to be stable at about 20 μm on a side and the surface coverage further increases to nearly 100% after 45 min of reaction time (Figure d,e). With increasing reaction time, the pyramids become more regular and are more uniformly distributed on the Si surface, which is consistent with the previous literature . Importantly, as more and more pyramids are formed on the surface, the surface area increases with the etching duration.…”

“…The reflectance spectra of the silicon surface with different pyramid coverages are shown in Figure and Figure , Supporting Information. The overall reflectance of the silicon surface reduces with the coverage through the visible and near infrared range (from 300 to 1100 nm), which is consistent with previous observations . However, the reflectance of the Si surface with 99.9% coverage of pyramids is higher than in previous reports (18% vs 13% to be the lowest reflectance) .…”

“…The overall reflectance of the silicon surface reduces with the coverage through the visible and near infrared range (from 300 to 1100 nm), which is consistent with previous observations . However, the reflectance of the Si surface with 99.9% coverage of pyramids is higher than in previous reports (18% vs 13% to be the lowest reflectance) . This might be due to the inhomogeneity of the pyramid size on the surface which results in a more severe scatter effect rather than antireflection.…”

Broadband angular color stability of dielectric thin film-coated pyramidal textured Si for photovoltaics

“…In the case of monocrystalline silicon, a random upright pyramid texture, created by wet alkaline etching, is most commonly used. [15][16][17][18] This texture reduces reflectance and increases light trapping, and thus contributes to an increase in the current output of the solar cell 15,[19][20][21] and is also cheaper to realize than a perfectly planar substrate surface. In this paper, it is shown that such substrates coloured with single layer thin film coatings possess better angular colour stability than planar substrates coated with identical coatings.…”

Selective rounding for pyramid peaks and valleys improves the performance of SHJ solar cells

“…[5][6][7] Chemical polishing is an effective way to modify the pyramid profile. A common method of chemical polishing is etching textured wafer in an HNO 3 + HF solution, 6,[8][9][10][11] which has been applied on an industrial scale in Panasonic's HIT solar cell factories. 12,13 In recent years, ozone-based bath has been introduced as an alternative cleaning process, which is more environmentally friendly than traditional RCA cleaning.…”