2015 International Conference on Recent Developments in Control, Automation and Power Engineering (RDCAPE) 2015
DOI: 10.1109/rdcape.2015.7281360
|View full text |Cite
|
Sign up to set email alerts
|

Optimization and scaling of an SOI TFET with back gate control

Abstract: A hetero gate dielectric SOI TFET is presented here.The device performance is observed in TCAD. The effect of channel doping on the device characteristics is studied. Moreover, the effect of different gate dielectrics on the ON current, OFF current, band-to-band generation rate due to different body layer thickness, and variation of oxide thickness effect on ON and OFF currents are observed. The variation of transfer characteristics, band-to-band generation rate for various back gate voltages are also observed… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Year Published

2022
2022
2024
2024

Publication Types

Select...
2
1

Relationship

0
3

Authors

Journals

citations
Cited by 3 publications
references
References 16 publications
0
0
0
Order By: Relevance