2014
DOI: 10.1088/1742-6596/557/1/012056
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Optimization and Experiment of Electromagnetic Energy Harvester by Using NdFeB Sputtered on High-aspect-ratio Corrugated Si

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Cited by 3 publications
(1 citation statement)
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“…Applying the double-sided magnet to our previous device [6], the curvature radius of moving mass will be improved. Figure 1a shows an SEM photograph of the sputtered NdFeB/Ta multilayer film on a silicon trench structure with depth of 300 µm by using a deep-RIE (reactive ion etching) process.…”
Section: Introductionmentioning
confidence: 99%
“…Applying the double-sided magnet to our previous device [6], the curvature radius of moving mass will be improved. Figure 1a shows an SEM photograph of the sputtered NdFeB/Ta multilayer film on a silicon trench structure with depth of 300 µm by using a deep-RIE (reactive ion etching) process.…”
Section: Introductionmentioning
confidence: 99%