Optically Transparent and Highly Conductive Electrodes for Acousto-Optical Devices

Abstract

The study was devoted to the creation of transparent electrodes based on highly conductive mesh structures. The analysis and reasonable choice of technological approaches to the production of such materials with a high Q factor (the ratio of transparency and electrical conductivity) were carried out. The developed manufacturing technology consists of the formation of grooves in a transparent substrate by photolithography methods, followed by reactive ion plasma etching and their metallization by chemical deposition using the silver mirror reaction. Experimental samples of a transparent electrode fabricated using this technology have a sheet resistance of about 0.1 Ω/sq with a light transmittance in the visible wavelength range of more than 60%.

Low-power laser manufacturing of copper tracks on 3D printed geometry using liquid polyimide coating

“…An alternative approach has been the development of solution-assisted laser patterning for writing circuits on polymeric substrates 5,18,19 . Previously reported work successfully demonstrated the deposition of micro copper tracks on polyetherimide using optically reduced nanoparticles of Ag as a seed layer 20,21 . In this case, photoreduction was achieved using a low-power visible light laser under ambient conditions.…”

“…5,18,19 Previously reported work successfully demonstrated the deposition of micro copper tracks on polyetherimide using optically reduced nanoparticles of Ag as a seed layer. 20,21 In this case, photoreduction was achieved using a lowpower visible light laser under ambient conditions. In this process, metal ions are used as the seed layer, with silver having shown a particularly high performance.…”

Eco-Friendly Scalable Manufacturing Silver Transparent Сonductive Mesh and Silver Micro Caps, in One Technological Cycle for Efficient EMI Shielding Materials for 5G Communications

“…As a rule, only metal micro and nanostructures have a shielding efficiency of more than 30 dB. Examples include micro and nanomeshes formed using photolithography [32][33][34], imprint lithography [35], cracked template [36][37][38], and Ag nanowires (Ag NW) films [39,40].…”