Optically controlled deflector based on a thin-film waveguide

Abstract

MOTS C L~S :X-ray microscopy Microscopie X Electron beam lithography Lithographie 6lectronique SUMMARY : We repon the manufacture of germanium phase zone plates as objective lenses for high resolution X-ray imaging at 2.4nm wavelength. The phase shifting properties of the germanium can be used to enhancc the diffraction efficiency of a zone plate. Zone plate pattems with smcture widths down to 30 nm are generated by low distortion electron beam lithography. The S~C~U T~S are transferred into a 280nm thick layer of germanium by reactive ion etching (RIE) using a highly selective vilevel mask. 100 nm thick baron doped silicon windows made fmm si& crys!n_! ~yafprs serve as high transmission support membranes. Measurements at the BESSY storage ring proved diffraction efficiencies up to 6.2 %. X-ray imaging of a test object showed clearly resolved 30 nm features.