Optical waveguides etched in 6FDA-ODA by focused ion beam

Chiron, D.; Trigaud, Thierry; Moliton, Jean-Pierre

doi:10.1016/s0379-6779(01)00416-7

Cited by 10 publications

(8 citation statements)

References 6 publications

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“…The FIB column has been designed and built in the laboratory to perform micromachining in polymers 6, 20. This set‐up uses a field‐effect ion source (FEIS) of Ga + ions with an accelerating energy varying from 6 to 30 keV.…”

Section: Methodsmentioning

confidence: 99%

“…To avoid this drawback, which is typical of organic devices, an elegant method is to use dry processes. As submicronic dimensions are needed for telecommunications wavelengths, micromachining by focused ion beam (FIB) appears as an attractive tool 6. Furthermore, this process can be implemented as die‐sinker for low cost industrial production, because the serial‐fabrication of polymeric PBG lattices could then be carried out by embossing or inking the plastic materials by means of the dies.…”

Section: Introductionmentioning

confidence: 99%

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Focused ion beam micromachining and computation of polymeric photonic band gap

Pialat

Trigaud²,

Moliton³

et al. 2007

J Polym Sci B Polym Phys

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This article introduces a new approach to the achievement of low cost devices for optical telecommunications. For this purpose, the implementation of polymer components and of the WDM method show several advantages. A polymeric photonic band gap lattice can effectively assume demultiplexing at the wavelength of 1.55 μm without energy dissipation. First, the computation of the geometrical parameters designing a polymer photonic crystal by means of the finite‐difference‐time‐domain method, implemented with Bloch functions, is presented here. Second, the achievement of 2D polymer lattices by a dry process, the focused ion beam milling, is exposed. The experimental conditions for the achievement of a master are discussed on the basis of the milling performances and of the polymers physical properties. © 2007 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 45: 2993–3002, 2007

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Section: Methodsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Focused ion beam micromachining and computation of polymeric photonic band gap

Pialat

Trigaud²,

Moliton³

et al. 2007

J Polym Sci B Polym Phys

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“…The latter is also called the refresh time because it corresponds to the relaxation time that is necessary for the polymer to return at a temperature lower than that of the glass transition. The determination of the scan timing by the spot is truly acute [5]. Figure 6 illustrates a square lattice in PMMA of emerging square slabs with a constant lattice a= 3 Htm.…”

Section: B Experimenetal Conditions For Etching Of Polyiners Bymentioning

confidence: 99%

“…As micronic dimensions are needed for telecommunicatons wavelengths. micromachining by Focused Ion Beam (FIB) appears as an obvious technique [5]. Furthermore this process can be implemented as die-senk-er for low cost industrial production.…”

Section: Introductionmentioning

confidence: 99%

2D polymeric devices with photonic band gap (PBG) for telecommunications at 1.55 /spl mu/m

Pialat

Trigaud

Moliton

et al. 2004

2004 IEEE International Symposium on Industrial Electronics

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This paper introduces a new approach to the achievement of low cost devices for optical telecommunications. For this purpose, the implementation of polymer components and of the WDM method shows several advantages. A polymeric Photonic Band Gap (PBG) lattice effectively can assume the demultiplexing at around the wavelength of 1.55 ftm. Here is firstly presented the computation of the suitable parameters for the polymer Photonic Crystal by means of the Finite-Difference-Time-Domain (FDTD) method.Secondlv, the achievement of polymer lattices by-a dry-process, the Focused Ion Beam milling, is exposed. The experimental achievements are discussed on the basis of the determination of the lattice parameters bv an adapted software.

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“…[2,3] For example, some of the underlying mechanisms may vary significantly for high and low ion beam irradiation. It has also been reported that the introduction of water vapour to the surface of polymer samples during FIB milling provides a significant increase in the milling yield of polymers.…”

Section: Introductionmentioning

confidence: 99%

Focused ion beam irradiation—morphological and chemical evolution in PMMA

Kochumalayil

Meiser

Soldera

et al. 2009

Surface & Interface Analysis

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For poly(methyl methacrylate) (PMMA) as a representative of amorphous thermoplastic polymers, the milling effects, and the chemical changes due to ion bombardment with a focused ion beam (FIB) at normal incidence are studied with scanning force microscopy (SFM), scanning electron microscopy (SEM)/energy dispersive X-ray (EDX), and infrared (IR) spectroscopy for varying conditions of Ga + treatment, including the effect of partial water pressure. Stopping and Range of Ions in Matter (SRIM) simulation results for 30 keV Ga + at normal incidence show that the zone of primary ion-polymer interaction extends ca 100 nm into the PMMA. Accordingly, this interaction region is much wider than the original beam diameter. The width of the region where the recoiled ions interact strongly with the polymer chains is larger. Secondary processes, such as fragment diffusion and phonon transport, are expected to extend even farther into the polymer. SEM and SFM reveal distinct topologies of areas milled without or in presence of water vapour. Water vapour-assisted FIB milling produces more roughness and defects. The infrared attenuated total reflection spectroscopy (IR-ATR) spectra indicate that ion milling in PMMA damages methacrylate side groups in particular. In contrary to metals, an increase in the degree of milling is found when the beam spot overlap parameter increases.

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Optical waveguides etched in 6FDA-ODA by focused ion beam

Cited by 10 publications

References 6 publications

Focused ion beam micromachining and computation of polymeric photonic band gap

Focused ion beam micromachining and computation of polymeric photonic band gap

2D polymeric devices with photonic band gap (PBG) for telecommunications at 1.55 /spl mu/m

Focused ion beam irradiation—morphological and chemical evolution in PMMA

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