Two-dimensional (2-D) transition metal dichalcogenides (TMDs) are a family of nanostructures possessing exciting physical properties relevant toward applications often requiring fabrication of macroscopic films and networks. Here, we demonstrate electrophoretic deposition (EPD) for assembly of a broad range of 2-D TMDs, including molybdenum disulfide (MoS 2 ), molybdenum diselenide (MoSe 2 ), and tungsten disulfide (WS 2 ), into uniform coatings that can be universally applied on both planar and porous three-dimensional foam electrodes. This assembly process can be directly coupled with solvent exfoliation to yield one-batch processing capable of transforming bulk TMD powders into functional films and coatings of 2-D TMD nanostructures. EPD from common exfoliating solvents 1-methyl-2-pyrollidone (NMP) and acetonitrile (ACN) indicates assembly kinetics governed by the inherent solution properties of the solvents, with poorer exfoliation in ACN compared to NMP, but more rapid deposition kinetics in ACN compared to NMP. In-situ absorbance monitoring indicates the capability to completely deposit all dispersed mass of highly purified 2-D TMDs onto a solid substrate. Overall, our work demonstrates EPD as a versatile and efficient route to assemble 2-D TMD nanostructures directly from exfoliated dispersions into planar and 3-D substrates for use in diverse applications.The heightened interest in two-dimensional (2-D) materials in recent years has led to tremendous interest in the novel electronic, optical, chemical, and electrochemical properties of these materials that can strongly differ from that observed in bulk materials. 1-3 Specifically, the transition metal dichalcogenides (TMDs) have received widespread attention due to the versatile chemical and electronic properties that arise from the available compositions, structures, and dimensionalities. 4-6 Unlike 2-D carbon sheets, TMDs represent a group of elements exhibiting a variable bandgap dependent on the number of layers in the sample, the elemental composition, and the presence of doping atoms which make them ideal for electronic and electrochemical devices. 7 TMDs are represented by the general formula MX 2 , and are composed of both a transition metal element (M) and a chalcogen species (X). Materials with this general formula characteristically possess a unique layered structure in which covalently bonded planes of M and X atoms are held together through weak van der Waals interaction. This unique atomic architecture enables facile exfoliation of the material to ultra-thin structures as small as one layer thick when starting with bulk materials. 8 Despite this straightforward route for liquid processing, current methods to produce high quality TMD materials for applications pivot around high cost, energy intensive, and low-yield techniques such as chemical vapor deposition or mechanical cleavage. 9 These routes are not suited for producing vast quantities of material, and this is a significant challenge for many applications, such as in electrochemical (e....