Optical thin film linear-polarization selector fabricated by oblique angle deposition

Park, Yong Jun; Sobahan, K. M. A.; Kim, Ji Bum; Kim, Jin Joo; Zou, Yu; Hwangbo, Chang Kwon

doi:10.1364/oic.2010.wc2

Cited by 1 publication

(1 citation statement)

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“…The degree of the anisotropy and the porosity is strongly dependent on deposition angle, material and deposition conditions. The optical anisotropy and the porosity of the thin films has various applications, such as optical retardation plates, circular polarization filters, wideband antireflection coatings, broadband high reflectors, three-dimensional photonic crystals, photonics and biomedical devices, microsensors, replication of patterns, negative index metamaterials and multiple surface-plasmon-polariton waves [11][12][13][14][15][16][17][18][19][20][21].…”

Section: Introductionmentioning

confidence: 99%

Nanostructured optical thin films fabricated by oblique angle deposition

Sobahan

Park

Kim

et al. 2010

Adv. Nat. Sci: Nanosci. Nanotechnol.

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Oblique angle deposition (OAD) is a sophisticated technique to fabricate engineered nanostructured thin films for next generation optical nanodevices. In this technique, oblique angle deposition and substrate rotation are employed to control the columnar and helical nanostructures of thin films. The films deposited by this technique show the optical anisotropy, the porosity, or the chirality, depending on the controlled morphologies at the nano-scale. In this review paper, the nanostructured optical thin film devices, such as a circular polarization handedness inverter, a linear polarization-discriminatory inverter and the selective coatings on nanopatterns, are fabricated by electron beam evaporation using the OAD technique, and their optical and structural properties as nanooptical devices are described.

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