Optical Study of TiO<sub>2</sub>Thin Films Prepared by Sol-Gel

Bouabid, K.; Ihlal, A.; Amira, Y.; Sdaq, A.; Assabbane, Ali; Ait‐Ichou, Y.; Outzourhit, A.; Ameziane, E.L.; Nouet, G.

doi:10.1080/00150190802381779

Cited by 9 publications

(3 citation statements)

References 13 publications

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“…Different methods such as electron beam evaporation, sputtering, chemical vapour deposition, sol-gel process [8][9][10][11], have been used to prepare TiO 2 films. The spin coating sol-gel method is a low cost large surface area liquid-deposition process yielding homogeneous deposits [12,13], for which the properties of the films can be controlled by the solution composition.…”

Section: Introductionmentioning

confidence: 99%

Fabrication and Characterization of Spin-coated TiO2 Films

et al. 2014

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Porous TiO 2 films were deposited on glass and ITO coated glass substrates by spin coating for spinning rates of 2000, 5000, 2000 followed by successive run of 5000 rpm (2000-5000). The AFM, SEM, XRD and UV-Vis analysis of the films coated on bare glass substrates for individual and 2000-5000 rpm runs showed amorphous and crystalline behaviours respectively, while TiO 2 films deposited on ITO/Glass substrates show crystalline structure. Both substrate nature and thickness of the films influence the formation of the crystallinity of the films. Also AFM images reveal that the roughness values of the films are independent of substrate.

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Section: Introductionmentioning

confidence: 99%

Fabrication and Characterization of Spin-coated TiO2 Films

et al. 2014

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“…Solgel, sputtering, spin coating, dip coating etc. methods have been used to prepare TiO2 film [8]. Spin coating method is a low cost method for thin film preparation [9].…”

Section: Introductionmentioning

confidence: 99%

Effect of Al Doping on Thickness, Optical, Morphological and Structural Properties of TiO2 Thin Film Prepared by Spin Coating Method

Rahman¹,

Kaiyum²,

Islam³

2018

JTFR

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Pure TiO2 thin films and Al doped TiO2 thin films have been prepared by spin coating method. This work is carried out to determine the effect of Al on TiO2 thin film. Because of Al doping thickness, optical properties, band gap, surface morphology, and structural properties of TiO2 thin film changes. X-ray diffraction (XRD), Atomic Force Microscopy (AFM), Gravimetric Analysis, and UV-vis. Spectroscopy were carried out to find out the micro-structure, surface morphology, surface roughness, thickness and optical properties of the thin films. 0.5 M TiO2 thin film shows 473 nm thicknesses where it changes with Al doping. Al also changes the crystal structure and the surface roughness of the film and both of them are carried out by using XRD analysis and AFM analysis. The surface roughness of the films was 12.239 nm for undoped TiO2 thin film and for 6% Al doped the roughness increases to 85 nm which were calculated by using AFM analysis. The grain size of Al doped TiO2 thin film was 19.51 nm and 26.95 nm were measured by XRD analysis.

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“…Particular phase formation of TiO 2 depends on the starting material nature, its composition, deposition technique, and annealing temperatures. TiO 2 thin films can be papered by different methods including electron beam evaporation, Sputtering, Pulse Laser Deposition, Chemical Vapor Deposition, Polymer technique and sol-gel method [6][7][8][9][10][11]. The sol-gel is a quick and easy technique to produce homogeneous organic films with large surface areas.…”

Section: Introductionmentioning

confidence: 99%

Effect of Annealing Temperature on the Structural and Optical Properties of TiO<sub>2</sub> Thin Film Prepared by Sol-gel Method

Khan

Zubair

Ansar³

et al. 2016

J. Sci. Res.

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The effect of annealing temperatures on the surface morphology and optical properties of titanium dioxide (TiO 2 ) thin films deposited by spin coating on Silicon substrate was studied. The TiO 2 thin films deposited onto silicon substrates were annealed at different temperatures. The structural and optical properties were studied using scanning electron microscopy (SEM), X-ray diffraction technique (XRD) and optical ellipsometer. The results indicated that the structural properties of the TiO 2 thin films were changed with the increase in annealing temperature. The SEM investigation showed that as annealing temperature was increased, the grain and pores size were increased. The XRD patterns of the studied samples showed that rutile phase were found in a sample annealed at high temperature. The ellipsometry investigation shows that the refractive index increased while energy band gap decreased with the annealing temperature. The results showed that surface porosity, optical properties and surface morphology of TiO 2 could be affected by changing the annealing temperature.

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Optical Study of TiO₂Thin Films Prepared by Sol-Gel

Cited by 9 publications

References 13 publications

Fabrication and Characterization of Spin-coated TiO2 Films

Fabrication and Characterization of Spin-coated TiO2 Films

Effect of Al Doping on Thickness, Optical, Morphological and Structural Properties of TiO2 Thin Film Prepared by Spin Coating Method

Effect of Annealing Temperature on the Structural and Optical Properties of TiO<sub>2</sub> Thin Film Prepared by Sol-gel Method

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Optical Study of TiO2Thin Films Prepared by Sol-Gel

Cited by 9 publications

References 13 publications

Fabrication and Characterization of Spin-coated TiO2 Films

Fabrication and Characterization of Spin-coated TiO2 Films

Effect of Al Doping on Thickness, Optical, Morphological and Structural Properties of TiO2 Thin Film Prepared by Spin Coating Method

Effect of Annealing Temperature on the Structural and Optical Properties of TiO<sub>2</sub> Thin Film Prepared by Sol-gel Method

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Optical Study of TiO₂Thin Films Prepared by Sol-Gel