Optical Study of Laser Ablation Plasma Irradiation for the Bacteria Sterilization using Metal Oxide Target

Abstract

PLA plasma sterilization of yeast fungus and spore-forming bacteria was performed using Ti and TiO2 target. The experimental results suggested that both the yeast fungus and spore-forming bacteria could be sterilized by plasma irradiation generated by pulsed laser ablation method. The effect using pure Ti target slightly stronger than that of the TiO2 target. This results suggests that the main sterilization factors were considered to be high energy metal atoms and/or ions in this system.

Preparation of tris(8-hydroxyquinolinato)aluminum thin films by sputtering deposition using powder and pressed powder targets

“…This dependence of the deposition rate had the same tendency as that in our previous work on TiO 2 films and Bi 3 Fe 5 O 12 films. [23][24][25][26][27] Therefore, the electron density of the processing plasma using a powder target may be higher than that using a pressed target, and the electron density of the plasma may increase with increasing RF power under our experimental conditions. We also prepared films at gas pressures of 0.3 and 10 Pa using powder and pressed powder targets.…”

“…This may be due to the density of the high-energy Alq 3 molecule increasing with increasing net-cathode surface area and=or angle changes in the sputtered ions irradiated, as shown in our previous work. [23][24][25][26][27] In addition, the target surface was deteriorated by ion bombardment and=or heating in the sputtering plasma, and the net electron density using the pressed powder target was less than that when using the powder target.…”

“…[12][13][14][15][16][17][18] We have also studied thin-film preparation using PLD, and deposited high-quality functional thin films. [19][20][21][22][23][24][25][26][27] In PVD, high-density bulk targets are generally used. Therefore, when preparing a thin film with multiple elements by this method, it is necessary to form new targets by other methods such as spark plasma sintering and by pressing targets with high pressure.…”

Crystal Al-Doped ZnO Thin-Film Preparation by Sputtering Deposition using a Mixed-Powder Target

“…As an alternative, plasma processes using multielement powder targets have been used to prepare functional multielement thin films in single-step processes [15][16][17][18][19][20][21][22][23][24][25][26][27][28][29] . In this process, several kinds of powder can be mixed and placed in a target holder in a vacuum chamber.…”

Sterilization for Bacillus Subtilis var. natto by Low Pressure Sputtering and Laser Ablation Plasma using Metal Powder Target

“…However, the effects of atmospheric plasma on several kinds of bacteria are not strong, and long-term sterilization damages the operator, patient, and substrate that is placed on the sterilization subject [7][8][9][10]. To solve this subject, we have been studied the effects of low pressure plasma on sterilization using pulsed laser ablation (PLA) plasma [10][11][12][13]. In general, it is considered that the degree of ionization at the very close to the target during the early phase of PLA plasma should be very high, and the plasma area may be very reactive.…”