“…Graphene, a honey-combed sp 2 carbon structure, has gained some milestone breakthroughs, including high-quality single crystalline graphene growth, − vital fundamental discoveries, , and their applications. , Simultaneously, the discovery of graphene and its fast development have propelled the booming of other two-dimensional (2D) materials. − For the purpose of their chemical modification and patterning, the conventional reactive ion etching (RIE) or its derivative inductively coupled plasma (ICP) RIE has been directly applied to them. , The plasma-based RIE technique is renowned for its high etching efficiency and good anisotropy . However, the highly dynamic charged ions inevitably result in surface amorphization, and the coexisting arbitrary neutral radicals can reduce the etching anisotropy. − For the atom-thick 2D materials, the plasma treatment can drastically degrade the intrinsic properties, like quenching the quantum emission of modified hexagonal boron nitride (hBN) . In order to reduce the ion bombing damage, neutral radical beams are filtered from the plasma to etch graphene mildly. , Moreover, when the RIE technique is combined with the conventional lithography, it is a big challenge to eliminate the surface organic residues from soft masks …”