2019
DOI: 10.1109/tasc.2019.2908546
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Optical Spectroscopic Study of AlN-Based SIS Devices Grown by Inductively Coupled Plasma

Abstract: High quality Nb-based superconductor-insulatorsuperconductor (SIS) junctions with Al oxide (AlOx) tunnel barriers grown from Al overlayers are widely reported in the literature. However, the thin barriers required for high critical current density (Jc) junctions exhibit defects that result in significant subgap leakage current that is detrimental for many applications. High quality, high-Jc junctions can be realized with AlNx barriers, but control of Jc is more difficult than with AlOx. It is therefore of inte… Show more

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Cited by 3 publications
(2 citation statements)
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“…Formation of the Ninterstitial defect complex in δ − NbN causes strong smearing of electronic structure by creating atomic disorder in the films and thus a significant reduction in the N(ǫ F ) which strongly influencing the electronphonon coupling strength and consequently reduces the T C . Increase in the T C of vacuum annealed δ − NbN [29][30][31] and degradation of superconducting properties at N 2 atmosphere [32,33] further support our proposed mechanism. Based on above analysis we suggest that to obtain δ − NbN with high T C , films should be grown at Nb-rich conditions to avoid N interstitial defects and annealing of samples in a vacuum is recommended to eliminate residual N atoms.…”
mentioning
confidence: 56%
“…Formation of the Ninterstitial defect complex in δ − NbN causes strong smearing of electronic structure by creating atomic disorder in the films and thus a significant reduction in the N(ǫ F ) which strongly influencing the electronphonon coupling strength and consequently reduces the T C . Increase in the T C of vacuum annealed δ − NbN [29][30][31] and degradation of superconducting properties at N 2 atmosphere [32,33] further support our proposed mechanism. Based on above analysis we suggest that to obtain δ − NbN with high T C , films should be grown at Nb-rich conditions to avoid N interstitial defects and annealing of samples in a vacuum is recommended to eliminate residual N atoms.…”
mentioning
confidence: 56%
“…We also note that there is no temperature range where the Arrhenius plot reveals linear behavior over an extended temperature range, indicating that there is no well-defined activation energy. Interestingly, figure 3 structures, strain, and alloying [18,19,30,31]. Growth of Aucatalyzed SiGe NWs on polycrystalline NbTiN could facilitate the interdiffusion of atoms (e.g.…”
Section: Resultsmentioning
confidence: 99%