Abstract:In recent years, semiconductor manufacturing process has made great progress. To avoid lithography hotspots and enhance the yield of integrated circuits, we can use Model-based Optical Proximity Correction (MBOPC) to improve image fidelity and printability. However, the optical lithography simulation of MBOPC is a time-consuming calculation. In this paper, we propose an effective MBOPC to obtain a modified mask with high-resolution. The proposed OPC flow is divided into three steps: (1) Pre-simulation generate… Show more
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