2017
DOI: 10.1007/s11664-017-5552-3
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Optical Properties of TiO2 Films Deposited by Reactive Electron Beam Sputtering

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Cited by 40 publications
(11 citation statements)
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“…Its main advantages are its optical properties (a high refractive index, and transparency in the visible and NIR range) and its mechanical, physical and chemical properties (photocatalytic properties). The advantages of depositing TiO 2 coatings in the form of thin films have been demonstrated in many fields, including energy [ 11 ], photocatalysis [ 12 , 13 , 14 , 15 , 16 , 17 ], electronics [ 18 , 19 ], health [ 20 ], and optics [ 21 , 22 , 23 ]. Additionally, the coatings can be micro-nanostructured, thereby giving them new functionalities and properties, e.g., improved absorption efficiency [ 24 ], hydrophobicity and enhanced tribological properties [ 25 ].…”
Section: Introductionmentioning
confidence: 99%
“…Its main advantages are its optical properties (a high refractive index, and transparency in the visible and NIR range) and its mechanical, physical and chemical properties (photocatalytic properties). The advantages of depositing TiO 2 coatings in the form of thin films have been demonstrated in many fields, including energy [ 11 ], photocatalysis [ 12 , 13 , 14 , 15 , 16 , 17 ], electronics [ 18 , 19 ], health [ 20 ], and optics [ 21 , 22 , 23 ]. Additionally, the coatings can be micro-nanostructured, thereby giving them new functionalities and properties, e.g., improved absorption efficiency [ 24 ], hydrophobicity and enhanced tribological properties [ 25 ].…”
Section: Introductionmentioning
confidence: 99%
“…However, despite comparable ionic radii and electronegativity, studies available in the literature on the W-incorporated Ga 2 O 3 thin films reported on that amorphization occurs even for relatively lower W content and complete solid solution is possible only for a limited W concentration. , It must be noted that the ability to tune the processing conditions, particularly the deposition temperature required to produce crystalline materials in either chemical (CVD) or physical vapor deposition (PVD) methods of thin film fabrication, is limited. Furthermore, the CVD and PVD methods rely on nonequilibrium processes, where energetic ions will be taking part in thin film material production. Therefore, the true solubility limits of the compound material system and required processing temperatures required may not reflect the efficient means to understand the fundamental limits of solid solution formation. On the other hand, the high-temperature solid-state chemical reaction method is a simple, versatile method to produce chemical compounds, where the solubility limits and component mixtures can be easily understood and/or manipulated.…”
Section: Introductionmentioning
confidence: 99%
“…Ab initio моделирование атомной и электронной структуры SiO x <2 осуществлялось в программном пакете Quantum ESPRESSO в рамках теории функционала плотности (ТФП) для модели периодических суперячеек [15]. В расчетах использовался гибридный обменно-корреляционный функционал параметризации B3LYP, обеспечивающий корректное значение ширины запрещенной зоны high-k-диэлектриков [16,17]. Волновые функции валентных электронов (Si 3s 2 3p 2 и O 2s 2 2p 4 ) раскладывались по базису из плоских волн с энергией отсечки 950 eV, остов учитывался через сохраняющие норму псевдопотенциалы.…”
Section: материалы и методыunclassified