1989
DOI: 10.1016/0040-6090(89)90239-3
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Optical properties of non-stoichiometric tin oxide films obtained by reactive sputtering

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Cited by 68 publications
(23 citation statements)
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“…This difference in band gap of the SnO 2 film can result from the presence of non-stoichiometry of the deposited layers. It is well known that the optical band gap of the SnO 2 film varies from 3.4 to 4.6 eV [33][34][35].…”
Section: The Refractive Index Dispersion Properties Of the Sno 2 Filmmentioning
confidence: 99%
“…This difference in band gap of the SnO 2 film can result from the presence of non-stoichiometry of the deposited layers. It is well known that the optical band gap of the SnO 2 film varies from 3.4 to 4.6 eV [33][34][35].…”
Section: The Refractive Index Dispersion Properties Of the Sno 2 Filmmentioning
confidence: 99%
“…44 Sn oxide is well suited for Mössbauer work, and a number of studies on vacuum deposited films have reported valence state changes due to nonstoichiometry. [45][46][47][48][49][50][51][52][53][54][55][56] The technique has been applied to Li ϩ -conducting Sn-In sulphide spinels for solid state batteries. 57 Considering the importance of Sn oxide in solid state ionics, we believe that a detailed study using the Mössbauer effect is well justified for this material.…”
Section: Introductionmentioning
confidence: 99%
“…The obtained results reflect that the excess tin atoms locate in interstitial positions of the tetrahedral crystal. The influence of substrate temperature on the properties of SnO 2 films deposited by ultrasonic spray pyrolysis method was reported by Achour et al [33]. The average crystallite sizes and band gap energies were increased from 6.52 to 29.8 nm, and 4.03-4.133 eV, respectively with increasing substrate temperature from 400 to 500 °C.…”
Section: B Synthesis and Characterization Of Snomentioning
confidence: 84%